JPS5355977A - Rotary type chemical evaporation thin film formation device - Google Patents
Rotary type chemical evaporation thin film formation deviceInfo
- Publication number
- JPS5355977A JPS5355977A JP13043676A JP13043676A JPS5355977A JP S5355977 A JPS5355977 A JP S5355977A JP 13043676 A JP13043676 A JP 13043676A JP 13043676 A JP13043676 A JP 13043676A JP S5355977 A JPS5355977 A JP S5355977A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film formation
- rotary type
- formation device
- type chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:No pattern is provided on one of plural units of substrate installed on the table surface which is rotating within a bell-jar, and the light sent from a laser beam source located outside the bell-jar is reflected on the substrate and received with a photo cell, and the film thickness is culculated based on the output of the photo cell, thuse securing a thin film of a uniform thickness.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13043676A JPS5355977A (en) | 1976-11-01 | 1976-11-01 | Rotary type chemical evaporation thin film formation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13043676A JPS5355977A (en) | 1976-11-01 | 1976-11-01 | Rotary type chemical evaporation thin film formation device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5355977A true JPS5355977A (en) | 1978-05-20 |
JPS6129138B2 JPS6129138B2 (en) | 1986-07-04 |
Family
ID=15034181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13043676A Granted JPS5355977A (en) | 1976-11-01 | 1976-11-01 | Rotary type chemical evaporation thin film formation device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5355977A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5665974A (en) * | 1979-11-02 | 1981-06-04 | Komatsu Ltd | Vapor deposition controlling method |
JP2015074821A (en) * | 2013-10-11 | 2015-04-20 | 大陽日酸株式会社 | Film thickness measurement method for vapor phase growth apparatus |
-
1976
- 1976-11-01 JP JP13043676A patent/JPS5355977A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5665974A (en) * | 1979-11-02 | 1981-06-04 | Komatsu Ltd | Vapor deposition controlling method |
JP2015074821A (en) * | 2013-10-11 | 2015-04-20 | 大陽日酸株式会社 | Film thickness measurement method for vapor phase growth apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS6129138B2 (en) | 1986-07-04 |
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