JPS5355953A - Scanning electron microscope measuring microscale and method of fabricating same - Google Patents

Scanning electron microscope measuring microscale and method of fabricating same

Info

Publication number
JPS5355953A
JPS5355953A JP12747877A JP12747877A JPS5355953A JP S5355953 A JPS5355953 A JP S5355953A JP 12747877 A JP12747877 A JP 12747877A JP 12747877 A JP12747877 A JP 12747877A JP S5355953 A JPS5355953 A JP S5355953A
Authority
JP
Japan
Prior art keywords
layers
metals
deposited
thick
gold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12747877A
Other languages
English (en)
Inventor
Buritsugusu Baraado Deebitsudo
Ogubaan Fuiirudeingu
Paakaa Yangu Jiyon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
US Government
Original Assignee
US Government
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by US Government filed Critical US Government
Publication of JPS5355953A publication Critical patent/JPS5355953A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B3/00—Measuring instruments characterised by the use of mechanical techniques
    • G01B3/30—Bars, blocks, or strips in which the distance between a pair of faces is fixed, although it may be preadjustable, e.g. end measure, feeler strip
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49789—Obtaining plural product pieces from unitary workpiece

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Microscoopes, Condenser (AREA)
  • Luminescent Compositions (AREA)
JP12747877A 1976-10-29 1977-10-24 Scanning electron microscope measuring microscale and method of fabricating same Pending JPS5355953A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/736,978 US4068381A (en) 1976-10-29 1976-10-29 Scanning electron microscope micrometer scale and method for fabricating same

Publications (1)

Publication Number Publication Date
JPS5355953A true JPS5355953A (en) 1978-05-20

Family

ID=24962098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12747877A Pending JPS5355953A (en) 1976-10-29 1977-10-24 Scanning electron microscope measuring microscale and method of fabricating same

Country Status (11)

Country Link
US (2) US4068381A (ja)
JP (1) JPS5355953A (ja)
AU (1) AU505385B2 (ja)
BE (1) BE860196A (ja)
CA (1) CA1080369A (ja)
DE (1) DE2740224A1 (ja)
FR (1) FR2369544A1 (ja)
GB (1) GB1540780A (ja)
IE (1) IE45575B1 (ja)
IT (1) IT1090530B (ja)
NL (1) NL7711544A (ja)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE455736B (sv) * 1984-03-15 1988-08-01 Sarastro Ab Forfaringssett och anordning for mikrofotometrering och efterfoljande bildsammanstellning
US4655884A (en) * 1985-08-19 1987-04-07 General Electric Company Nickel plating of refractory metals
US4818873A (en) * 1987-10-30 1989-04-04 Vickers Instruments (Canada) Inc. Apparatus for automatically controlling the magnification factor of a scanning electron microscope
US5479252A (en) * 1993-06-17 1995-12-26 Ultrapointe Corporation Laser imaging system for inspection and analysis of sub-micron particles
US5923430A (en) * 1993-06-17 1999-07-13 Ultrapointe Corporation Method for characterizing defects on semiconductor wafers
JP2746125B2 (ja) * 1994-06-17 1998-04-28 日本電気株式会社 電子線露光装置の装置較正用基準マーク及び装置較正方法。
US5822875A (en) * 1995-08-09 1998-10-20 Siemens Aktiengesellschaft Scanning electron microscopic ruler and method
DE19604348C2 (de) * 1996-02-07 2003-10-23 Deutsche Telekom Ag Verfahren zur Herstellung einer kalibrierten Längenskala im Nanometerbereich für technische Geräte, die der hochauflösenden bis ultrahochauflösenden Abbildung von Strukturen dienen
US6148114A (en) * 1996-11-27 2000-11-14 Ultrapointe Corporation Ring dilation and erosion techniques for digital image processing
JPH1125898A (ja) * 1997-05-08 1999-01-29 Hitachi Ltd 電子顕微鏡の分解能評価方法および分解能評価用試料
JP4727777B2 (ja) * 1999-05-24 2011-07-20 株式会社日立製作所 走査形電子顕微鏡による測長方法
US6545275B1 (en) * 1999-09-03 2003-04-08 Applied Materials, Inc. Beam evaluation
US6570157B1 (en) 2000-06-09 2003-05-27 Advanced Micro Devices, Inc. Multi-pitch and line calibration for mask and wafer CD-SEM system
US6573497B1 (en) 2000-06-30 2003-06-03 Advanced Micro Devices, Inc. Calibration of CD-SEM by e-beam induced current measurement
US6573498B1 (en) 2000-06-30 2003-06-03 Advanced Micro Devices, Inc. Electric measurement of reference sample in a CD-SEM and method for calibration
US6750447B2 (en) * 2002-04-12 2004-06-15 Agere Systems, Inc. Calibration standard for high resolution electron microscopy
DE10225193B4 (de) * 2002-06-06 2004-08-12 Leica Microsystems (Schweiz) Ag Verfahren zur Kalibrierung der Vergrößerung eines Mikroskops sowie kalibrierbares Mikroskop
US6875982B2 (en) * 2003-08-29 2005-04-05 International Business Machines Corporation Electron microscope magnification standard providing precise calibration in the magnification range 5000X-2000,000X
US7323350B2 (en) * 2004-09-30 2008-01-29 Hitachi Global Storage Technologies Netherlands B.V. Method of fabricating thin film calibration features for electron/ion beam image based metrology
JP4650113B2 (ja) * 2005-06-09 2011-03-16 富士ゼロックス株式会社 積層構造体、ドナー基板、および積層構造体の製造方法
US8373113B2 (en) * 2008-11-05 2013-02-12 Hitachi High-Technologies Corporation Calibration standard member, method for manufacturing the member and scanning electronic microscope using the member

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2116927A (en) * 1935-04-20 1938-05-10 Germer Edmund Electrical discharge device
US2859158A (en) * 1957-01-31 1958-11-04 Glenn R Schaer Method of making a nickel-chromium diffusion alloy
DE1932926A1 (de) * 1969-06-28 1971-01-21 Siemens Ag Vorrichtung zur Justierung des Elektronenstrahles einer Mikrosonde
US3987529A (en) * 1971-11-01 1976-10-26 Asahi Kasei Kogyo Kabushiki Kaisha Valve and method for manufacturing the same
US3954420A (en) * 1975-06-24 1976-05-04 Whyco Chromium Co., Inc. Non-ferrous corrosion resistant undercoating
US4005527A (en) * 1975-12-22 1977-02-01 Wilson Ralph S Depth gauge

Also Published As

Publication number Publication date
NL7711544A (nl) 1978-05-03
IE45575L (en) 1978-04-29
FR2369544A1 (fr) 1978-05-26
US4068381A (en) 1978-01-17
IT1090530B (it) 1985-06-26
AU2808677A (en) 1979-03-01
BE860196A (fr) 1978-02-15
GB1540780A (en) 1979-02-14
AU505385B2 (en) 1979-11-15
DE2740224A1 (de) 1978-05-11
US4139933A (en) 1979-02-20
CA1080369A (en) 1980-06-24
IE45575B1 (en) 1982-10-06

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