JPS5352593A - Electron rays-sensitive polymer - Google Patents
Electron rays-sensitive polymerInfo
- Publication number
- JPS5352593A JPS5352593A JP12849676A JP12849676A JPS5352593A JP S5352593 A JPS5352593 A JP S5352593A JP 12849676 A JP12849676 A JP 12849676A JP 12849676 A JP12849676 A JP 12849676A JP S5352593 A JPS5352593 A JP S5352593A
- Authority
- JP
- Japan
- Prior art keywords
- sensitive polymer
- electron rays
- affording
- meth
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 title abstract 2
- 229920002126 Acrylic acid copolymer Polymers 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
Landscapes
- Processes Of Treating Macromolecular Substances (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12849676A JPS5352593A (en) | 1976-10-26 | 1976-10-26 | Electron rays-sensitive polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12849676A JPS5352593A (en) | 1976-10-26 | 1976-10-26 | Electron rays-sensitive polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5352593A true JPS5352593A (en) | 1978-05-13 |
| JPS5338193B2 JPS5338193B2 (cs) | 1978-10-13 |
Family
ID=14986171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12849676A Granted JPS5352593A (en) | 1976-10-26 | 1976-10-26 | Electron rays-sensitive polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5352593A (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5983157A (ja) * | 1982-09-28 | 1984-05-14 | エクソン・リサ−チ・アンド・エンジニアリング・カンパニ− | ポジ型重合体レジストの感度及びコントラストを増大させる方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU4719279A (en) * | 1978-05-22 | 1979-11-29 | Western Electric Co. Inc. | Lithographic resist and device processing utilizing same |
| JPS5795103U (cs) * | 1980-12-02 | 1982-06-11 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4915372A (cs) * | 1972-03-24 | 1974-02-09 | ||
| JPS511971A (en) * | 1974-06-25 | 1976-01-09 | Meidensha Electric Mfg Co Ltd | Kaiheikino sosasochi |
| US3984582A (en) * | 1975-06-30 | 1976-10-05 | Ibm | Method for preparing positive resist image |
-
1976
- 1976-10-26 JP JP12849676A patent/JPS5352593A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4915372A (cs) * | 1972-03-24 | 1974-02-09 | ||
| JPS511971A (en) * | 1974-06-25 | 1976-01-09 | Meidensha Electric Mfg Co Ltd | Kaiheikino sosasochi |
| US3984582A (en) * | 1975-06-30 | 1976-10-05 | Ibm | Method for preparing positive resist image |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5983157A (ja) * | 1982-09-28 | 1984-05-14 | エクソン・リサ−チ・アンド・エンジニアリング・カンパニ− | ポジ型重合体レジストの感度及びコントラストを増大させる方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5338193B2 (cs) | 1978-10-13 |
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