JPS5348077B1 - - Google Patents
Info
- Publication number
- JPS5348077B1 JPS5348077B1 JP2885772A JP2885772A JPS5348077B1 JP S5348077 B1 JPS5348077 B1 JP S5348077B1 JP 2885772 A JP2885772 A JP 2885772A JP 2885772 A JP2885772 A JP 2885772A JP S5348077 B1 JPS5348077 B1 JP S5348077B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D3/00—Control of position or direction
- G05D3/12—Control of position or direction using feedback
- G05D3/14—Control of position or direction using feedback using an analogue comparing device
- G05D3/18—Control of position or direction using feedback using an analogue comparing device delivering a series of pulses
- G05D3/183—Control of position or direction using feedback using an analogue comparing device delivering a series of pulses using stepping motor
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T1/00—General purpose image data processing
- G06T1/0014—Image feed-back for automatic industrial control, e.g. robot with camera
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Theoretical Computer Science (AREA)
- Automation & Control Theory (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12659771A | 1971-03-22 | 1971-03-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5348077B1 true JPS5348077B1 (US06633600-20031014-M00021.png) | 1978-12-26 |
Family
ID=22425706
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2885772A Pending JPS5348077B1 (US06633600-20031014-M00021.png) | 1971-03-22 | 1972-03-22 | |
JP8285478A Pending JPS54133077A (en) | 1971-03-22 | 1978-07-07 | Device for automatically matching two superposed articles such as semiconductor wafer and transparent mask |
JP1981160164U Pending JPS5794942U (US06633600-20031014-M00021.png) | 1971-03-22 | 1981-10-27 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8285478A Pending JPS54133077A (en) | 1971-03-22 | 1978-07-07 | Device for automatically matching two superposed articles such as semiconductor wafer and transparent mask |
JP1981160164U Pending JPS5794942U (US06633600-20031014-M00021.png) | 1971-03-22 | 1981-10-27 |
Country Status (5)
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63178573U (US06633600-20031014-M00021.png) * | 1987-05-11 | 1988-11-18 | ||
JP2009188404A (ja) * | 2008-02-01 | 2009-08-20 | Asml Netherlands Bv | アラインメントマーク及びこのようなアラインメントマークを備える基板の位置合わせ方法 |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3796497A (en) * | 1971-12-01 | 1974-03-12 | Ibm | Optical alignment method and apparatus |
US3943359A (en) * | 1973-06-15 | 1976-03-09 | Hitachi, Ltd. | Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope |
DE2335227A1 (de) * | 1973-07-11 | 1975-01-30 | Leitz Ernst Gmbh | Verfahren zur ausrichtung der winkellage eines werkstueckes mit optisch erfassbaren strukturen relativ zu einer bezugsrichtung sowie einrichtungen zu dessen durchfuehrung |
US3890508A (en) * | 1973-12-28 | 1975-06-17 | Texas Instruments Inc | Workpiece alignment system |
JPS607764B2 (ja) * | 1976-04-28 | 1985-02-27 | キヤノン株式会社 | 走査型光検出装置 |
US4097750A (en) * | 1977-03-18 | 1978-06-27 | General Motors Corporation | Method of orienting objects using optically smeared images |
DE2846316A1 (de) * | 1978-10-24 | 1980-06-04 | Siemens Ag | Verfahren und vorrichtung zur automatischen ausrichtung von zwei aufeinander einzujustierenden objekten |
US4977361A (en) * | 1978-06-26 | 1990-12-11 | Eaton Corporation | X-Y addressable workpiece positioner and mask aligner using same |
US4687980A (en) * | 1980-10-20 | 1987-08-18 | Eaton Corporation | X-Y addressable workpiece positioner and mask aligner using same |
DE2930979A1 (de) * | 1979-07-31 | 1981-02-26 | Optimetrix Corp | Verfahren und vorrichtung zur zweidimensionalen positionierung eines werkstueckes |
US4310743A (en) * | 1979-09-24 | 1982-01-12 | Hughes Aircraft Company | Ion beam lithography process and apparatus using step-and-repeat exposure |
EP0036026B1 (de) * | 1980-03-10 | 1986-11-12 | Eaton-Optimetrix Inc. | Adressierbare Positioniervorrichtung |
US4335313A (en) * | 1980-05-12 | 1982-06-15 | The Perkin-Elmer Corporation | Method and apparatus for aligning an opaque mask with an integrated circuit wafer |
US4357540A (en) * | 1980-12-19 | 1982-11-02 | International Business Machines Corporation | Semiconductor device array mask inspection method and apparatus |
US4397559A (en) * | 1981-02-19 | 1983-08-09 | University Of Pittsburgh | Apparatus for processing electromagnetic radiation and method |
JPS57183034A (en) * | 1981-05-07 | 1982-11-11 | Toshiba Corp | Electron bean transfer device |
JPS5882248A (ja) * | 1981-11-12 | 1983-05-17 | Canon Inc | 自動整合装置 |
JPS5999721A (ja) * | 1982-11-29 | 1984-06-08 | Canon Inc | マーク検出装置 |
JPS59172724A (ja) * | 1983-03-22 | 1984-09-29 | Canon Inc | マーク検出装置 |
DE3336901A1 (de) * | 1983-10-11 | 1985-04-18 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Maskenmarkierung und substratmarkierung fuer ein verfahren zum justieren einer eine maskenmarkierung enthaltenden photomaske auf einer substratmarkierung |
US4555968A (en) * | 1984-06-07 | 1985-12-03 | Preco Industries, Inc. | Web fed die cutting press having automatic 3-axis die registration system |
US4853880A (en) * | 1985-08-23 | 1989-08-01 | Canon Kabushiki Kaisha | Device for positioning a semi-conductor wafer |
US4972498A (en) * | 1988-07-07 | 1990-11-20 | Grumman Aerospace Corporation | Alignment system for an optical matched filter correlator |
WO1991011056A1 (en) * | 1990-01-18 | 1991-07-25 | Spetsialnoe Konstruktorskoe Bjuro Radioelektronnoi Apparatury Instituta Radiofiziki I Elektroniki Akademii Nauk Armyanskoi Ssr | Method and device for adjustment of photoelectric converter of shaft rotation angle into code |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3497705A (en) * | 1968-02-12 | 1970-02-24 | Itek Corp | Mask alignment system using radial patterns and flying spot scanning |
-
1971
- 1971-03-22 US US126597A patent/US3683195A/en not_active Expired - Lifetime
-
1972
- 1972-03-17 DE DE2213171A patent/DE2213171C3/de not_active Expired
- 1972-03-17 DE DE19722265346 patent/DE2265346A1/de active Pending
- 1972-03-21 GB GB1322372A patent/GB1326178A/en not_active Expired
- 1972-03-22 JP JP2885772A patent/JPS5348077B1/ja active Pending
-
1976
- 1976-11-04 HK HK697/76*UA patent/HK69776A/xx unknown
-
1978
- 1978-07-07 JP JP8285478A patent/JPS54133077A/ja active Pending
-
1981
- 1981-10-27 JP JP1981160164U patent/JPS5794942U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3497705A (en) * | 1968-02-12 | 1970-02-24 | Itek Corp | Mask alignment system using radial patterns and flying spot scanning |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63178573U (US06633600-20031014-M00021.png) * | 1987-05-11 | 1988-11-18 | ||
JP2009188404A (ja) * | 2008-02-01 | 2009-08-20 | Asml Netherlands Bv | アラインメントマーク及びこのようなアラインメントマークを備える基板の位置合わせ方法 |
US8208121B2 (en) | 2008-02-01 | 2012-06-26 | Asml Netherlands B.V. | Alignment mark and a method of aligning a substrate comprising such an alignment mark |
Also Published As
Publication number | Publication date |
---|---|
DE2213171A1 (de) | 1972-10-19 |
US3683195A (en) | 1972-08-08 |
DE2213171B2 (de) | 1978-07-27 |
DE2213171C3 (de) | 1979-04-05 |
DE2265346A1 (de) | 1977-08-04 |
JPS54133077A (en) | 1979-10-16 |
HK69776A (en) | 1976-11-12 |
GB1326178A (en) | 1973-08-08 |
JPS5794942U (US06633600-20031014-M00021.png) | 1982-06-11 |