JPS5340536B2 - - Google Patents

Info

Publication number
JPS5340536B2
JPS5340536B2 JP12595074A JP12595074A JPS5340536B2 JP S5340536 B2 JPS5340536 B2 JP S5340536B2 JP 12595074 A JP12595074 A JP 12595074A JP 12595074 A JP12595074 A JP 12595074A JP S5340536 B2 JPS5340536 B2 JP S5340536B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12595074A
Other languages
Japanese (ja)
Other versions
JPS5151938A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12595074A priority Critical patent/JPS5151938A/ja
Publication of JPS5151938A publication Critical patent/JPS5151938A/ja
Publication of JPS5340536B2 publication Critical patent/JPS5340536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00—Technologies for solid waste management
    • Y02W30/50—Reuse, recycling or recovery technologies
    • Y02W30/62—Plastics recycling; Rubber recycling

Landscapes

  • Manufacturing Of Printed Circuit Boards (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12595074A 1974-10-31 1974-10-31 Fuotorejisutono kaikahoho Granted JPS5151938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12595074A JPS5151938A (en) 1974-10-31 1974-10-31 Fuotorejisutono kaikahoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12595074A JPS5151938A (en) 1974-10-31 1974-10-31 Fuotorejisutono kaikahoho

Publications (2)

Publication Number Publication Date
JPS5151938A JPS5151938A (en) 1976-05-07
JPS5340536B2 true JPS5340536B2 (enrdf_load_stackoverflow) 1978-10-27

Family

ID=14922972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12595074A Granted JPS5151938A (en) 1974-10-31 1974-10-31 Fuotorejisutono kaikahoho

Country Status (1)

Country Link
JP (1) JPS5151938A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2726813C2 (de) * 1976-06-17 1984-02-23 Motorola, Inc., 60196 Schaumburg, Ill. Verfahren zur Herstellung eines mit einem Muster versehenen Substrats
JPS5587438A (en) * 1978-12-25 1980-07-02 Fujitsu Ltd Manufacture of semiconductor device
DE2945854A1 (de) * 1979-11-13 1981-05-21 Deutsche Itt Industries Gmbh, 7800 Freiburg Ionenimplantationsverfahren
JPH0624191B2 (ja) * 1985-08-20 1994-03-30 シャープ株式会社 プラズマ処理方法
JP2724165B2 (ja) * 1987-08-28 1998-03-09 株式会社東芝 有機化合物膜の除去方法及び除去装置
JP2646596B2 (ja) * 1987-12-21 1997-08-27 松下電器産業株式会社 ドライエッチング方法
JPH0354571A (ja) * 1989-07-21 1991-03-08 Matsushita Electric Ind Co Ltd 感光性樹脂の除去方法
JP4860325B2 (ja) * 2006-03-31 2012-01-25 シャープ株式会社 金属および／または金属化合物が加工されたディスプレイ基材の再資源化方法、ならびに再資源化装置

Also Published As

Publication number Publication date
JPS5151938A (en) 1976-05-07

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