JPS5339127A - Photo resist frilling agent - Google Patents

Photo resist frilling agent

Info

Publication number
JPS5339127A
JPS5339127A JP11336676A JP11336676A JPS5339127A JP S5339127 A JPS5339127 A JP S5339127A JP 11336676 A JP11336676 A JP 11336676A JP 11336676 A JP11336676 A JP 11336676A JP S5339127 A JPS5339127 A JP S5339127A
Authority
JP
Japan
Prior art keywords
frilling
agent
photo resist
resist
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11336676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5517376B2 (cg-RX-API-DMAC10.html
Inventor
Takateru Asano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Original Assignee
Fuji Yakuhin Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK filed Critical Fuji Yakuhin Kogyo KK
Priority to JP11336676A priority Critical patent/JPS5339127A/ja
Publication of JPS5339127A publication Critical patent/JPS5339127A/ja
Publication of JPS5517376B2 publication Critical patent/JPS5517376B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11336676A 1976-09-21 1976-09-21 Photo resist frilling agent Granted JPS5339127A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11336676A JPS5339127A (en) 1976-09-21 1976-09-21 Photo resist frilling agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11336676A JPS5339127A (en) 1976-09-21 1976-09-21 Photo resist frilling agent

Publications (2)

Publication Number Publication Date
JPS5339127A true JPS5339127A (en) 1978-04-10
JPS5517376B2 JPS5517376B2 (cg-RX-API-DMAC10.html) 1980-05-10

Family

ID=14610446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11336676A Granted JPS5339127A (en) 1976-09-21 1976-09-21 Photo resist frilling agent

Country Status (1)

Country Link
JP (1) JPS5339127A (cg-RX-API-DMAC10.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54132031A (en) * 1978-04-05 1979-10-13 Okamura Corp Ignition plug free from carbon attachment
JPS61163342A (ja) * 1985-01-14 1986-07-24 Ricoh Co Ltd フオトレジスト除去方法
CN105467782A (zh) * 2015-12-15 2016-04-06 吴来友 一种去胶液及其制备方法
WO2019111479A1 (ja) * 2017-12-07 2019-06-13 株式会社Ｊｃｕ レジストの剥離液
WO2020022491A1 (ja) * 2018-07-27 2020-01-30 花王株式会社 洗浄方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59138240U (ja) * 1983-03-04 1984-09-14 日立精工株式会社 固体高速大電流スイツチ素子

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54132031A (en) * 1978-04-05 1979-10-13 Okamura Corp Ignition plug free from carbon attachment
JPS61163342A (ja) * 1985-01-14 1986-07-24 Ricoh Co Ltd フオトレジスト除去方法
CN105467782A (zh) * 2015-12-15 2016-04-06 吴来友 一种去胶液及其制备方法
WO2019111479A1 (ja) * 2017-12-07 2019-06-13 株式会社Ｊｃｕ レジストの剥離液
WO2020022491A1 (ja) * 2018-07-27 2020-01-30 花王株式会社 洗浄方法
JPWO2020022491A1 (ja) * 2018-07-27 2021-08-19 花王株式会社 洗浄方法

Also Published As

Publication number Publication date
JPS5517376B2 (cg-RX-API-DMAC10.html) 1980-05-10

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