JPS5339127A - Photo resist frilling agent - Google Patents
Photo resist frilling agentInfo
- Publication number
- JPS5339127A JPS5339127A JP11336676A JP11336676A JPS5339127A JP S5339127 A JPS5339127 A JP S5339127A JP 11336676 A JP11336676 A JP 11336676A JP 11336676 A JP11336676 A JP 11336676A JP S5339127 A JPS5339127 A JP S5339127A
- Authority
- JP
- Japan
- Prior art keywords
- frilling
- agent
- photo resist
- resist
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11336676A JPS5339127A (en) | 1976-09-21 | 1976-09-21 | Photo resist frilling agent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11336676A JPS5339127A (en) | 1976-09-21 | 1976-09-21 | Photo resist frilling agent |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5339127A true JPS5339127A (en) | 1978-04-10 |
JPS5517376B2 JPS5517376B2 (en) | 1980-05-10 |
Family
ID=14610446
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11336676A Granted JPS5339127A (en) | 1976-09-21 | 1976-09-21 | Photo resist frilling agent |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5339127A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54132031A (en) * | 1978-04-05 | 1979-10-13 | Okamura Corp | Ignition plug free from carbon attachment |
JPS61163342A (en) * | 1985-01-14 | 1986-07-24 | Ricoh Co Ltd | Method for removing photoresist |
CN105467782A (en) * | 2015-12-15 | 2016-04-06 | 吴来友 | Glue cleaning liquid and preparation method therefor |
WO2019111479A1 (en) * | 2017-12-07 | 2019-06-13 | 株式会社Jcu | Resist stripping solution |
WO2020022491A1 (en) * | 2018-07-27 | 2020-01-30 | 花王株式会社 | Cleaning method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59138240U (en) * | 1983-03-04 | 1984-09-14 | 日立精工株式会社 | Solid state high speed high current switch element |
-
1976
- 1976-09-21 JP JP11336676A patent/JPS5339127A/en active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54132031A (en) * | 1978-04-05 | 1979-10-13 | Okamura Corp | Ignition plug free from carbon attachment |
JPS5512715B2 (en) * | 1978-04-05 | 1980-04-03 | ||
JPS61163342A (en) * | 1985-01-14 | 1986-07-24 | Ricoh Co Ltd | Method for removing photoresist |
CN105467782A (en) * | 2015-12-15 | 2016-04-06 | 吴来友 | Glue cleaning liquid and preparation method therefor |
WO2019111479A1 (en) * | 2017-12-07 | 2019-06-13 | 株式会社Jcu | Resist stripping solution |
WO2020022491A1 (en) * | 2018-07-27 | 2020-01-30 | 花王株式会社 | Cleaning method |
JPWO2020022491A1 (en) * | 2018-07-27 | 2021-08-19 | 花王株式会社 | Cleaning method |
Also Published As
Publication number | Publication date |
---|---|
JPS5517376B2 (en) | 1980-05-10 |
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