JPS5336334B2 - - Google Patents

Info

Publication number
JPS5336334B2
JPS5336334B2 JP11942372A JP11942372A JPS5336334B2 JP S5336334 B2 JPS5336334 B2 JP S5336334B2 JP 11942372 A JP11942372 A JP 11942372A JP 11942372 A JP11942372 A JP 11942372A JP S5336334 B2 JPS5336334 B2 JP S5336334B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11942372A
Other languages
Japanese (ja)
Other versions
JPS4918040A (cs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/244,393 external-priority patent/US3982824A/en
Application filed filed Critical
Publication of JPS4918040A publication Critical patent/JPS4918040A/ja
Publication of JPS5336334B2 publication Critical patent/JPS5336334B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70233Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0621Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0626Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
    • G02B17/0642Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
JP11942372A 1972-04-17 1972-11-30 Expired JPS5336334B2 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/244,393 US3982824A (en) 1971-12-01 1972-04-17 Catoptric lens arrangement

Publications (2)

Publication Number Publication Date
JPS4918040A JPS4918040A (cs) 1974-02-18
JPS5336334B2 true JPS5336334B2 (cs) 1978-10-02

Family

ID=22922552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11942372A Expired JPS5336334B2 (cs) 1972-04-17 1972-11-30

Country Status (3)

Country Link
JP (1) JPS5336334B2 (cs)
CA (1) CA1002800A (cs)
FR (1) FR2180636B1 (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197007A (ja) * 1983-04-22 1984-11-08 Yasuto Ozaki レ−ザ光により投光線を得る装置
US7720197B2 (en) * 2008-05-30 2010-05-18 Rigaku Innovative Technologies, Inc. High intensity x-ray beam system

Also Published As

Publication number Publication date
CA1002800A (en) 1977-01-04
FR2180636A1 (cs) 1973-11-30
JPS4918040A (cs) 1974-02-18
FR2180636B1 (cs) 1976-10-29

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