FR2180636A1 - - Google Patents

Info

Publication number
FR2180636A1
FR2180636A1 FR7242375A FR7242375A FR2180636A1 FR 2180636 A1 FR2180636 A1 FR 2180636A1 FR 7242375 A FR7242375 A FR 7242375A FR 7242375 A FR7242375 A FR 7242375A FR 2180636 A1 FR2180636 A1 FR 2180636A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7242375A
Other languages
French (fr)
Other versions
FR2180636B1 (cs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/244,393 external-priority patent/US3982824A/en
Application filed by Raytheon Co filed Critical Raytheon Co
Publication of FR2180636A1 publication Critical patent/FR2180636A1/fr
Application granted granted Critical
Publication of FR2180636B1 publication Critical patent/FR2180636B1/fr
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70233Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0621Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0626Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
    • G02B17/0642Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
FR7242375A 1972-04-17 1972-11-29 Expired FR2180636B1 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/244,393 US3982824A (en) 1971-12-01 1972-04-17 Catoptric lens arrangement

Publications (2)

Publication Number Publication Date
FR2180636A1 true FR2180636A1 (cs) 1973-11-30
FR2180636B1 FR2180636B1 (cs) 1976-10-29

Family

ID=22922552

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7242375A Expired FR2180636B1 (cs) 1972-04-17 1972-11-29

Country Status (3)

Country Link
JP (1) JPS5336334B2 (cs)
CA (1) CA1002800A (cs)
FR (1) FR2180636B1 (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197007A (ja) * 1983-04-22 1984-11-08 Yasuto Ozaki レ−ザ光により投光線を得る装置
US7720197B2 (en) * 2008-05-30 2010-05-18 Rigaku Innovative Technologies, Inc. High intensity x-ray beam system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Also Published As

Publication number Publication date
JPS5336334B2 (cs) 1978-10-02
CA1002800A (en) 1977-01-04
JPS4918040A (cs) 1974-02-18
FR2180636B1 (cs) 1976-10-29

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