CA1002800A - Catoptric lens arrangement - Google Patents

Catoptric lens arrangement

Info

Publication number
CA1002800A
CA1002800A CA157,919A CA157919A CA1002800A CA 1002800 A CA1002800 A CA 1002800A CA 157919 A CA157919 A CA 157919A CA 1002800 A CA1002800 A CA 1002800A
Authority
CA
Canada
Prior art keywords
lens arrangement
catoptric lens
catoptric
arrangement
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA157,919A
Other languages
English (en)
Other versions
CA157919S (en
Inventor
Werner R. Rambauske
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/244,393 external-priority patent/US3982824A/en
Application filed by Raytheon Co filed Critical Raytheon Co
Application granted granted Critical
Publication of CA1002800A publication Critical patent/CA1002800A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0621—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0626—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
    • G02B17/0642—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
CA157,919A 1972-04-17 1972-11-30 Catoptric lens arrangement Expired CA1002800A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/244,393 US3982824A (en) 1971-12-01 1972-04-17 Catoptric lens arrangement

Publications (1)

Publication Number Publication Date
CA1002800A true CA1002800A (en) 1977-01-04

Family

ID=22922552

Family Applications (1)

Application Number Title Priority Date Filing Date
CA157,919A Expired CA1002800A (en) 1972-04-17 1972-11-30 Catoptric lens arrangement

Country Status (3)

Country Link
JP (1) JPS5336334B2 (cs)
CA (1) CA1002800A (cs)
FR (1) FR2180636B1 (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197007A (ja) * 1983-04-22 1984-11-08 Yasuto Ozaki レ−ザ光により投光線を得る装置
US7720197B2 (en) * 2008-05-30 2010-05-18 Rigaku Innovative Technologies, Inc. High intensity x-ray beam system

Also Published As

Publication number Publication date
JPS5336334B2 (cs) 1978-10-02
FR2180636A1 (cs) 1973-11-30
JPS4918040A (cs) 1974-02-18
FR2180636B1 (cs) 1976-10-29

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