JPS53325B2 - - Google Patents
Info
- Publication number
- JPS53325B2 JPS53325B2 JP4647674A JP4647674A JPS53325B2 JP S53325 B2 JPS53325 B2 JP S53325B2 JP 4647674 A JP4647674 A JP 4647674A JP 4647674 A JP4647674 A JP 4647674A JP S53325 B2 JPS53325 B2 JP S53325B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4647674A JPS53325B2 (en, 2012) | 1974-04-26 | 1974-04-26 | |
| US05/766,348 US4191571A (en) | 1974-04-26 | 1977-02-07 | Method of pattern forming in a photosensitive composition having a reciprocity law failing property |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4647674A JPS53325B2 (en, 2012) | 1974-04-26 | 1974-04-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50141403A JPS50141403A (en, 2012) | 1975-11-13 |
| JPS53325B2 true JPS53325B2 (en, 2012) | 1978-01-07 |
Family
ID=12748235
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4647674A Expired JPS53325B2 (en, 2012) | 1974-04-26 | 1974-04-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53325B2 (en, 2012) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01135511U (en, 2012) * | 1988-03-04 | 1989-09-18 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0658533B2 (ja) * | 1987-07-28 | 1994-08-03 | 日本化薬株式会社 | 感光性樹脂組成物 |
| US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
| JP4390237B2 (ja) | 2000-02-14 | 2009-12-24 | 東洋合成工業株式会社 | 感光性化合物及び感光性樹脂 |
| JP4036440B2 (ja) | 2002-03-29 | 2008-01-23 | 東洋合成工業株式会社 | 新規な感光性化合物及び感光性樹脂並びに感光性組成物 |
| EP1348690A1 (en) | 2002-03-29 | 2003-10-01 | Toyo Gosei Kogyo Co., Ltd. | Cinnamaldehyde compound having an azido group |
| WO2020255529A1 (ja) | 2019-06-17 | 2020-12-24 | 東洋合成工業株式会社 | 細胞培養基板、該細胞培養基板の製造方法及び該細胞培養基板を用いたスクリーニング方法 |
-
1974
- 1974-04-26 JP JP4647674A patent/JPS53325B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01135511U (en, 2012) * | 1988-03-04 | 1989-09-18 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50141403A (en, 2012) | 1975-11-13 |