JPS5328379A - Electron lens device - Google Patents
Electron lens deviceInfo
- Publication number
- JPS5328379A JPS5328379A JP7413677A JP7413677A JPS5328379A JP S5328379 A JPS5328379 A JP S5328379A JP 7413677 A JP7413677 A JP 7413677A JP 7413677 A JP7413677 A JP 7413677A JP S5328379 A JPS5328379 A JP S5328379A
- Authority
- JP
- Japan
- Prior art keywords
- lens device
- electron lens
- lenses
- changing
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7413677A JPS5328379A (en) | 1977-06-22 | 1977-06-22 | Electron lens device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7413677A JPS5328379A (en) | 1977-06-22 | 1977-06-22 | Electron lens device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3764276A Division JPS52147977A (en) | 1976-04-02 | 1976-04-02 | Electronic lens unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5328379A true JPS5328379A (en) | 1978-03-16 |
| JPS5334470B2 JPS5334470B2 (enrdf_load_stackoverflow) | 1978-09-20 |
Family
ID=13538459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7413677A Granted JPS5328379A (en) | 1977-06-22 | 1977-06-22 | Electron lens device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5328379A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58156900A (ja) * | 1982-02-26 | 1983-09-17 | エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン | 帯電粒子ビ−ム装置 |
| JPS5941831A (ja) * | 1982-08-31 | 1984-03-08 | Toshiba Corp | 電子ビ−ム描画方法 |
| JPS59135727A (ja) * | 1983-01-24 | 1984-08-04 | Jeol Ltd | 荷電粒子ビ−ム露光方法 |
| JPS6211795U (enrdf_load_stackoverflow) * | 1985-07-08 | 1987-01-24 | ||
| JPS62115715A (ja) * | 1985-07-22 | 1987-05-27 | Toshiba Mach Co Ltd | 電子ビ−ム露光装置 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03120816U (enrdf_load_stackoverflow) * | 1990-03-20 | 1991-12-11 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52119080A (en) * | 1976-03-31 | 1977-10-06 | Fujitsu Ltd | Electron beam exposure |
-
1977
- 1977-06-22 JP JP7413677A patent/JPS5328379A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52119080A (en) * | 1976-03-31 | 1977-10-06 | Fujitsu Ltd | Electron beam exposure |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58156900A (ja) * | 1982-02-26 | 1983-09-17 | エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン | 帯電粒子ビ−ム装置 |
| JPS5941831A (ja) * | 1982-08-31 | 1984-03-08 | Toshiba Corp | 電子ビ−ム描画方法 |
| JPS59135727A (ja) * | 1983-01-24 | 1984-08-04 | Jeol Ltd | 荷電粒子ビ−ム露光方法 |
| JPS6211795U (enrdf_load_stackoverflow) * | 1985-07-08 | 1987-01-24 | ||
| JPS62115715A (ja) * | 1985-07-22 | 1987-05-27 | Toshiba Mach Co Ltd | 電子ビ−ム露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5334470B2 (enrdf_load_stackoverflow) | 1978-09-20 |
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