JPS5324785B2 - - Google Patents
Info
- Publication number
- JPS5324785B2 JPS5324785B2 JP9448676A JP9448676A JPS5324785B2 JP S5324785 B2 JPS5324785 B2 JP S5324785B2 JP 9448676 A JP9448676 A JP 9448676A JP 9448676 A JP9448676 A JP 9448676A JP S5324785 B2 JPS5324785 B2 JP S5324785B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9448676A JPS5320767A (en) | 1976-08-10 | 1976-08-10 | X-ray mask supporting underlayer and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9448676A JPS5320767A (en) | 1976-08-10 | 1976-08-10 | X-ray mask supporting underlayer and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5320767A JPS5320767A (en) | 1978-02-25 |
| JPS5324785B2 true JPS5324785B2 (lt) | 1978-07-22 |
Family
ID=14111603
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9448676A Granted JPS5320767A (en) | 1976-08-10 | 1976-08-10 | X-ray mask supporting underlayer and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5320767A (lt) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5725678U (lt) * | 1980-07-21 | 1982-02-10 | ||
| JPS5811250Y2 (ja) * | 1979-09-17 | 1983-03-02 | 欣志 藤本 | ちやわん |
| JPS62169675U (lt) * | 1986-04-18 | 1987-10-28 | ||
| JPS62174476U (lt) * | 1986-04-23 | 1987-11-06 | ||
| JPH0389669U (lt) * | 1989-12-27 | 1991-09-12 | ||
| EP0697630A1 (en) | 1987-09-30 | 1996-02-21 | Canon Kabushiki Kaisha | X-ray mask support |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57151945A (en) * | 1981-03-17 | 1982-09-20 | Hoya Corp | Photomask blank and its manufacture |
| US5082695A (en) * | 1988-03-08 | 1992-01-21 | 501 Fujitsu Limited | Method of fabricating an x-ray exposure mask |
| JPH0775219B2 (ja) * | 1989-01-18 | 1995-08-09 | 富士通株式会社 | Ｘ線露光マスクの製造方法 |
| JPH0473765A (ja) * | 1990-07-16 | 1992-03-09 | Toshiba Corp | Ｘ線透過膜およびその製法 |
| JPH1083951A (ja) * | 1996-09-06 | 1998-03-31 | Hoya Corp | Ｘ線マスクブランク及びｘ線マスク並びにパターン転写方法 |
| WO2005105650A1 (ja) | 2004-04-28 | 2005-11-10 | Mitsubishi Denki Kabushiki Kaisha | エレベータ装置 |
-
1976
- 1976-08-10 JP JP9448676A patent/JPS5320767A/ja active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5811250Y2 (ja) * | 1979-09-17 | 1983-03-02 | 欣志 藤本 | ちやわん |
| JPS5725678U (lt) * | 1980-07-21 | 1982-02-10 | ||
| JPS62169675U (lt) * | 1986-04-18 | 1987-10-28 | ||
| JPS62174476U (lt) * | 1986-04-23 | 1987-11-06 | ||
| EP0697630A1 (en) | 1987-09-30 | 1996-02-21 | Canon Kabushiki Kaisha | X-ray mask support |
| JPH0389669U (lt) * | 1989-12-27 | 1991-09-12 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5320767A (en) | 1978-02-25 |