JPS5324301B2 - - Google Patents
Info
- Publication number
- JPS5324301B2 JPS5324301B2 JP10299374A JP10299374A JPS5324301B2 JP S5324301 B2 JPS5324301 B2 JP S5324301B2 JP 10299374 A JP10299374 A JP 10299374A JP 10299374 A JP10299374 A JP 10299374A JP S5324301 B2 JPS5324301 B2 JP S5324301B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10299374A JPS5324301B2 (ja) | 1974-09-09 | 1974-09-09 | |
US05/590,933 US3972616A (en) | 1974-09-09 | 1975-06-27 | Apparatus for detecting the defects of the mask pattern using spatial filtering |
DE2539503A DE2539503C3 (de) | 1974-09-09 | 1975-09-05 | Verfahren und Vorrichtung zum Auffinden von Fehlerstellen nicht rechteckiger Form in einer Fotolithografie-Schablone mit Rechteckmuster |
FR7527416A FR2284143A1 (fr) | 1974-09-09 | 1975-09-08 | Procede et dispositif pour la detection de defauts dans un masque photolithographique |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10299374A JPS5324301B2 (ja) | 1974-09-09 | 1974-09-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5130354A JPS5130354A (ja) | 1976-03-15 |
JPS5324301B2 true JPS5324301B2 (ja) | 1978-07-20 |
Family
ID=14342208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10299374A Expired JPS5324301B2 (ja) | 1974-09-09 | 1974-09-09 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3972616A (ja) |
JP (1) | JPS5324301B2 (ja) |
DE (1) | DE2539503C3 (ja) |
FR (1) | FR2284143A1 (ja) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5276088A (en) * | 1975-12-22 | 1977-06-25 | Toshiba Corp | System for inspecting defects of pattern having directivity |
DE2739828C2 (de) * | 1977-09-03 | 1986-07-03 | Gesellschaft für Strahlen- und Umweltforschung mbH, 8000 München | Einrichtung zur Analyse von Proben |
JPS5823789Y2 (ja) * | 1978-07-18 | 1983-05-21 | 株式会社三井三池製作所 | 側角を付与したスクレ−パ−・コンベアを有するスクレ−パ−・リクレ−マ− |
US4292672A (en) * | 1979-03-19 | 1981-09-29 | Rca Corporation | Inspection system for detecting defects in regular patterns |
JPS55124117A (en) * | 1979-03-19 | 1980-09-25 | Toshiba Corp | Pattern inspecting apparatus |
US4349880A (en) * | 1979-03-19 | 1982-09-14 | Rca Corporation | Inspection system for detecting defects in regular patterns |
US4223345A (en) * | 1979-06-20 | 1980-09-16 | The United States Of America As Represented By The Secretary Of The Army | Method and apparatus for camouflage signature measurement |
US4334780A (en) * | 1979-06-29 | 1982-06-15 | Grumman Aerospace Corporation | Optical surface roughness detection method and apparatus |
US4465371A (en) * | 1979-08-06 | 1984-08-14 | Grumman Aerospace Corporation | Optical flaw detection method and apparatus |
JPS6027964B2 (ja) * | 1979-08-28 | 1985-07-02 | 工業技術院長 | 方向性ハイカツト空間周波数フイルタ |
JPS5766345A (en) * | 1980-10-09 | 1982-04-22 | Hitachi Ltd | Inspection device for defect |
DE3237826A1 (de) * | 1982-10-12 | 1984-04-12 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur optischen erkennung von defekten auf reflektierenden oberflaechen von mit strukturen im (my)m-bereich versehenen substraten |
DE3242219C1 (de) * | 1982-11-15 | 1984-02-16 | Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch | Optisches Markenerkennungsgeraet |
US4516833A (en) * | 1982-12-27 | 1985-05-14 | University Of Dayton | Production of high performance optical spatial filters |
JPS608804U (ja) * | 1983-06-30 | 1985-01-22 | 富士通株式会社 | 表面検査装置 |
US4922308A (en) * | 1986-06-27 | 1990-05-01 | Hitachi, Ltd. | Method of and apparatus for detecting foreign substance |
US5078501A (en) * | 1986-10-17 | 1992-01-07 | E. I. Du Pont De Nemours And Company | Method and apparatus for optically evaluating the conformance of unknown objects to predetermined characteristics |
US5159474A (en) * | 1986-10-17 | 1992-10-27 | E. I. Du Pont De Nemours And Company | Transform optical processing system |
US5235400A (en) * | 1988-10-12 | 1993-08-10 | Hitachi, Ltd. | Method of and apparatus for detecting defect on photomask |
JP2796316B2 (ja) * | 1988-10-24 | 1998-09-10 | 株式会社日立製作所 | 欠陥または異物の検査方法およびその装置 |
US5059023A (en) * | 1989-06-23 | 1991-10-22 | The United States Of America As Represented By The Secretary Of The Air Force | Angular deviation measurement system |
DE3926199A1 (de) * | 1989-08-08 | 1991-02-14 | Siemens Ag | Vorrichtung zur fehlererkennung in komplexen, relativ regelmaessigen strukturen |
JPH0776757B2 (ja) * | 1990-12-14 | 1995-08-16 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 光学的検査装置 |
US5177559A (en) * | 1991-05-17 | 1993-01-05 | International Business Machines Corporation | Dark field imaging defect inspection system for repetitive pattern integrated circuits |
US5155372A (en) * | 1991-11-26 | 1992-10-13 | International Business Machines Corporation | Optical inspection system utilizing wedge shaped spatial filter |
US5264912A (en) * | 1992-02-07 | 1993-11-23 | Tencor Instruments | Speckle reduction track filter apparatus for optical inspection of patterned substrates |
EP0562133B1 (en) * | 1992-03-23 | 1998-02-25 | Erland Torbjörn Sandström | Method and apparatus for forming an image |
US5276498A (en) * | 1992-05-12 | 1994-01-04 | Tencor Instruments | Adaptive spatial filter for surface inspection |
US5331370A (en) * | 1993-05-03 | 1994-07-19 | Hewlett-Packard Company | Method and apparatus for determining a feature-forming variant of a lithographic system |
US5469263A (en) * | 1994-07-01 | 1995-11-21 | Motorola, Inc. | Method for alignment in photolithographic processes |
DE19757106A1 (de) * | 1997-12-20 | 1999-06-24 | Juergen Prof Dr Massig | Topometer für spiegelnde Flächen |
US6366352B1 (en) | 1999-06-10 | 2002-04-02 | Applied Materials, Inc. | Optical inspection method and apparatus utilizing a variable angle design |
US6735745B2 (en) * | 2002-02-07 | 2004-05-11 | Applied Materials, Inc. | Method and system for detecting defects |
DE10258371B4 (de) * | 2002-12-12 | 2004-12-16 | Infineon Technologies Ag | Verfahren zur Inspektion von periodischen Gitterstrukturen auf Lithographiemasken |
US7244031B2 (en) * | 2004-07-08 | 2007-07-17 | Hewlett-Packard Development Company, L.P. | Light source arrangement |
DE102005031180B4 (de) * | 2005-07-01 | 2008-06-05 | König, Hans, Dr. | Strukturanalyseverfahren für geordnete Strukturen und Verwendung des Verfahrens |
JP2013518261A (ja) * | 2010-01-27 | 2013-05-20 | エーエスエムエル ホールディング エヌ.ブイ. | 空間フィルタを有するホログラフィックマスク検査システム |
US10310275B2 (en) * | 2015-09-07 | 2019-06-04 | Everready Precision Ind. Corp. | Optical apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3658420A (en) * | 1969-12-10 | 1972-04-25 | Bell Telephone Labor Inc | Photomask inspection by spatial filtering |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3614232A (en) * | 1968-11-25 | 1971-10-19 | Ibm | Pattern defect sensing using error free blocking spacial filter |
US3738752A (en) * | 1972-05-03 | 1973-06-12 | Western Electric Co | Intensity spatial filter having non-uniformly spaced filter elements |
-
1974
- 1974-09-09 JP JP10299374A patent/JPS5324301B2/ja not_active Expired
-
1975
- 1975-06-27 US US05/590,933 patent/US3972616A/en not_active Expired - Lifetime
- 1975-09-05 DE DE2539503A patent/DE2539503C3/de not_active Expired
- 1975-09-08 FR FR7527416A patent/FR2284143A1/fr active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3658420A (en) * | 1969-12-10 | 1972-04-25 | Bell Telephone Labor Inc | Photomask inspection by spatial filtering |
Also Published As
Publication number | Publication date |
---|---|
DE2539503C3 (de) | 1980-10-02 |
JPS5130354A (ja) | 1976-03-15 |
DE2539503B2 (de) | 1980-01-31 |
FR2284143A1 (fr) | 1976-04-02 |
US3972616A (en) | 1976-08-03 |
FR2284143B1 (ja) | 1981-06-12 |
DE2539503A1 (de) | 1976-03-18 |