JPS5321287A - Preparation of positive radiation sensitive material - Google Patents
Preparation of positive radiation sensitive materialInfo
- Publication number
- JPS5321287A JPS5321287A JP9497376A JP9497376A JPS5321287A JP S5321287 A JPS5321287 A JP S5321287A JP 9497376 A JP9497376 A JP 9497376A JP 9497376 A JP9497376 A JP 9497376A JP S5321287 A JPS5321287 A JP S5321287A
- Authority
- JP
- Japan
- Prior art keywords
- sensitive material
- radiation sensitive
- preparation
- positive radiation
- catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To provide positive radiation sensitive material comprising high molecular polymethylmethacrylate of high sensitivity which is suitable for fine pattern formation and information recording, by selecting the amount of catalyst as well as sealing reaction system.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9497376A JPS5321287A (en) | 1976-08-11 | 1976-08-11 | Preparation of positive radiation sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9497376A JPS5321287A (en) | 1976-08-11 | 1976-08-11 | Preparation of positive radiation sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5321287A true JPS5321287A (en) | 1978-02-27 |
Family
ID=14124843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9497376A Pending JPS5321287A (en) | 1976-08-11 | 1976-08-11 | Preparation of positive radiation sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5321287A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2498198A1 (en) * | 1981-01-22 | 1982-07-23 | Nippon Telegraph & Telephone | POSITIVE RESISTANT COATING AND METHOD FOR FORMING A DRAWING OF THIS COATING ON A SUBSTRATE |
-
1976
- 1976-08-11 JP JP9497376A patent/JPS5321287A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2498198A1 (en) * | 1981-01-22 | 1982-07-23 | Nippon Telegraph & Telephone | POSITIVE RESISTANT COATING AND METHOD FOR FORMING A DRAWING OF THIS COATING ON A SUBSTRATE |
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