JPS5321287A - Preparation of positive radiation sensitive material - Google Patents

Preparation of positive radiation sensitive material

Info

Publication number
JPS5321287A
JPS5321287A JP9497376A JP9497376A JPS5321287A JP S5321287 A JPS5321287 A JP S5321287A JP 9497376 A JP9497376 A JP 9497376A JP 9497376 A JP9497376 A JP 9497376A JP S5321287 A JPS5321287 A JP S5321287A
Authority
JP
Japan
Prior art keywords
sensitive material
radiation sensitive
preparation
positive radiation
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9497376A
Other languages
Japanese (ja)
Inventor
Masataka Miyamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP9497376A priority Critical patent/JPS5321287A/en
Publication of JPS5321287A publication Critical patent/JPS5321287A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To provide positive radiation sensitive material comprising high molecular polymethylmethacrylate of high sensitivity which is suitable for fine pattern formation and information recording, by selecting the amount of catalyst as well as sealing reaction system.
COPYRIGHT: (C)1978,JPO&Japio
JP9497376A 1976-08-11 1976-08-11 Preparation of positive radiation sensitive material Pending JPS5321287A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9497376A JPS5321287A (en) 1976-08-11 1976-08-11 Preparation of positive radiation sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9497376A JPS5321287A (en) 1976-08-11 1976-08-11 Preparation of positive radiation sensitive material

Publications (1)

Publication Number Publication Date
JPS5321287A true JPS5321287A (en) 1978-02-27

Family

ID=14124843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9497376A Pending JPS5321287A (en) 1976-08-11 1976-08-11 Preparation of positive radiation sensitive material

Country Status (1)

Country Link
JP (1) JPS5321287A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2498198A1 (en) * 1981-01-22 1982-07-23 Nippon Telegraph & Telephone POSITIVE RESISTANT COATING AND METHOD FOR FORMING A DRAWING OF THIS COATING ON A SUBSTRATE

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2498198A1 (en) * 1981-01-22 1982-07-23 Nippon Telegraph & Telephone POSITIVE RESISTANT COATING AND METHOD FOR FORMING A DRAWING OF THIS COATING ON A SUBSTRATE

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