JPS5318731B2 - - Google Patents
Info
- Publication number
- JPS5318731B2 JPS5318731B2 JP772173A JP772173A JPS5318731B2 JP S5318731 B2 JPS5318731 B2 JP S5318731B2 JP 772173 A JP772173 A JP 772173A JP 772173 A JP772173 A JP 772173A JP S5318731 B2 JPS5318731 B2 JP S5318731B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05F—SYSTEMS FOR REGULATING ELECTRIC OR MAGNETIC VARIABLES
- G05F1/00—Automatic systems in which deviations of an electric quantity from one or more predetermined values are detected at the output of the system and fed back to a device within the system to restore the detected quantity to its predetermined value or values, i.e. retroactive systems
- G05F1/10—Regulating voltage or current
- G05F1/12—Regulating voltage or current wherein the variable actually regulated by the final control device is AC
- G05F1/40—Regulating voltage or current wherein the variable actually regulated by the final control device is AC using discharge tubes or semiconductor devices as final control devices
- G05F1/44—Regulating voltage or current wherein the variable actually regulated by the final control device is AC using discharge tubes or semiconductor devices as final control devices semiconductor devices only
- G05F1/45—Regulating voltage or current wherein the variable actually regulated by the final control device is AC using discharge tubes or semiconductor devices as final control devices semiconductor devices only being controlled rectifiers in series with the load
- G05F1/455—Regulating voltage or current wherein the variable actually regulated by the final control device is AC using discharge tubes or semiconductor devices as final control devices semiconductor devices only being controlled rectifiers in series with the load with phase control
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- General Physics & Mathematics (AREA)
- Radar, Positioning & Navigation (AREA)
- Electromagnetism (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Control Of Resistance Heating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2201999A DE2201999C3 (de) | 1972-01-17 | 1972-01-17 | Vorrichtung zum elektrischen Beheizen eines sich infolge eines Abscheidungsprozesses aus der Gasphase verdickenden Halbleiterstabes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4886131A JPS4886131A (OSRAM) | 1973-11-14 |
| JPS5318731B2 true JPS5318731B2 (OSRAM) | 1978-06-16 |
Family
ID=5833172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP772173A Expired JPS5318731B2 (OSRAM) | 1972-01-17 | 1973-01-17 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3821515A (OSRAM) |
| JP (1) | JPS5318731B2 (OSRAM) |
| BE (1) | BE794139A (OSRAM) |
| DE (1) | DE2201999C3 (OSRAM) |
| DK (1) | DK132050C (OSRAM) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2528192C3 (de) * | 1975-06-24 | 1979-02-01 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Vorrichtung zum Abscheiden von elementarem Silicium auf einen aus elementarem Silicium bestehenden stabförmigen Trägerkörper |
| DE3319734C2 (de) * | 1983-05-31 | 1994-02-03 | Osaka Titanium | Vorrichtung zur Einspeisung der Heizleistung in polykristalline Halbleiterstäbe |
| JP2673762B2 (ja) * | 1992-06-18 | 1997-11-05 | 東京部品工業株式会社 | ブレーキライニング摩耗検知器の取付構造 |
| DE102010012238A1 (de) * | 2010-03-20 | 2011-09-22 | D. Krieger Gmbh | IR-Flächenbeheizungsvorrichtung und Verfahren zum Betreiben derselben |
| EP3478024B1 (de) * | 2017-10-26 | 2021-01-27 | Siemens Aktiengesellschaft | Einschalten einer heizlast |
-
0
- BE BE794139D patent/BE794139A/xx unknown
-
1972
- 1972-01-17 DE DE2201999A patent/DE2201999C3/de not_active Expired
-
1973
- 1973-01-04 US US00321034A patent/US3821515A/en not_active Expired - Lifetime
- 1973-01-16 DK DK24473*#A patent/DK132050C/da active
- 1973-01-17 JP JP772173A patent/JPS5318731B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4886131A (OSRAM) | 1973-11-14 |
| DE2201999A1 (de) | 1973-07-26 |
| BE794139A (fr) | 1973-07-17 |
| DE2201999C3 (de) | 1981-12-10 |
| DK132050B (da) | 1975-10-13 |
| DE2201999B2 (de) | 1981-02-19 |
| US3821515A (en) | 1974-06-28 |
| DK132050C (da) | 1976-03-08 |