JPS53106392A - Chemical plating method in gas phase - Google Patents

Chemical plating method in gas phase

Info

Publication number
JPS53106392A
JPS53106392A JP2016877A JP2016877A JPS53106392A JP S53106392 A JPS53106392 A JP S53106392A JP 2016877 A JP2016877 A JP 2016877A JP 2016877 A JP2016877 A JP 2016877A JP S53106392 A JPS53106392 A JP S53106392A
Authority
JP
Japan
Prior art keywords
gas phase
plating method
chemical plating
gas
gas quantity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016877A
Other languages
Japanese (ja)
Other versions
JPS5518784B2 (en
Inventor
Kenji Ikezawa
Mikiya Komatsu
Motohide Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Motor Co Ltd
Original Assignee
Nissan Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Motor Co Ltd filed Critical Nissan Motor Co Ltd
Priority to JP2016877A priority Critical patent/JPS53106392A/en
Publication of JPS53106392A publication Critical patent/JPS53106392A/en
Publication of JPS5518784B2 publication Critical patent/JPS5518784B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45506—Turbulent flow

Abstract

PURPOSE:To plate uniform and smooth film rapidly, inexpensively, and easily by supplying reaction gas contg. gas phase plating material to a material to be plated contained in a reaction tube at least in two directions, and by increasing or decreasing the gas quantity in each direction periodically with total gas quantity maintained at nearly constant.
JP2016877A 1977-02-28 1977-02-28 Chemical plating method in gas phase Granted JPS53106392A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2016877A JPS53106392A (en) 1977-02-28 1977-02-28 Chemical plating method in gas phase

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016877A JPS53106392A (en) 1977-02-28 1977-02-28 Chemical plating method in gas phase

Publications (2)

Publication Number Publication Date
JPS53106392A true JPS53106392A (en) 1978-09-16
JPS5518784B2 JPS5518784B2 (en) 1980-05-21

Family

ID=12019627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016877A Granted JPS53106392A (en) 1977-02-28 1977-02-28 Chemical plating method in gas phase

Country Status (1)

Country Link
JP (1) JPS53106392A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0119103A2 (en) * 1983-03-14 1984-09-19 Energy Conversion Devices, Inc. Process gas introduction and channeling system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0119103A2 (en) * 1983-03-14 1984-09-19 Energy Conversion Devices, Inc. Process gas introduction and channeling system

Also Published As

Publication number Publication date
JPS5518784B2 (en) 1980-05-21

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