JPS5425166A - Vapor-phase growth device - Google Patents

Vapor-phase growth device

Info

Publication number
JPS5425166A
JPS5425166A JP9067977A JP9067977A JPS5425166A JP S5425166 A JPS5425166 A JP S5425166A JP 9067977 A JP9067977 A JP 9067977A JP 9067977 A JP9067977 A JP 9067977A JP S5425166 A JPS5425166 A JP S5425166A
Authority
JP
Japan
Prior art keywords
phase growth
vapor
growth device
conveyance
moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9067977A
Other languages
Japanese (ja)
Other versions
JPS6136369B2 (en
Inventor
Sueo Tsumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP9067977A priority Critical patent/JPS5425166A/en
Publication of JPS5425166A publication Critical patent/JPS5425166A/en
Publication of JPS6136369B2 publication Critical patent/JPS6136369B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)

Abstract

PURPOSE:To attain continuous vapor-phase growth, by moving a substrate under conveyance to a reactor device deviated from its conveyance path.
JP9067977A 1977-07-27 1977-07-27 Vapor-phase growth device Granted JPS5425166A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9067977A JPS5425166A (en) 1977-07-27 1977-07-27 Vapor-phase growth device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9067977A JPS5425166A (en) 1977-07-27 1977-07-27 Vapor-phase growth device

Publications (2)

Publication Number Publication Date
JPS5425166A true JPS5425166A (en) 1979-02-24
JPS6136369B2 JPS6136369B2 (en) 1986-08-18

Family

ID=14005213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9067977A Granted JPS5425166A (en) 1977-07-27 1977-07-27 Vapor-phase growth device

Country Status (1)

Country Link
JP (1) JPS5425166A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125614A (en) * 1982-12-28 1984-07-20 Fujitsu Ltd Manufacture of semiconductor device
JPS59125613A (en) * 1982-12-28 1984-07-20 Fujitsu Ltd Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125614A (en) * 1982-12-28 1984-07-20 Fujitsu Ltd Manufacture of semiconductor device
JPS59125613A (en) * 1982-12-28 1984-07-20 Fujitsu Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS6136369B2 (en) 1986-08-18

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