JPS53101276A - Decompression cvd device - Google Patents
Decompression cvd deviceInfo
- Publication number
- JPS53101276A JPS53101276A JP1498277A JP1498277A JPS53101276A JP S53101276 A JPS53101276 A JP S53101276A JP 1498277 A JP1498277 A JP 1498277A JP 1498277 A JP1498277 A JP 1498277A JP S53101276 A JPS53101276 A JP S53101276A
- Authority
- JP
- Japan
- Prior art keywords
- cvd device
- decompression cvd
- decompression
- pressure
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1498277A JPS53101276A (en) | 1977-02-16 | 1977-02-16 | Decompression cvd device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1498277A JPS53101276A (en) | 1977-02-16 | 1977-02-16 | Decompression cvd device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53101276A true JPS53101276A (en) | 1978-09-04 |
JPS6228569B2 JPS6228569B2 (ja) | 1987-06-22 |
Family
ID=11876161
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1498277A Granted JPS53101276A (en) | 1977-02-16 | 1977-02-16 | Decompression cvd device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53101276A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5714287U (ja) * | 1980-06-24 | 1982-01-25 | ||
JPS5785220A (en) * | 1980-11-18 | 1982-05-27 | Fujitsu Ltd | Plasma cvd device |
JPS58101421A (ja) * | 1981-12-11 | 1983-06-16 | Canon Inc | 堆積膜の製造装置 |
JPS6115976A (ja) * | 1984-07-03 | 1986-01-24 | Matsushita Electric Ind Co Ltd | プラズマ反応装置およびその使用方法 |
JPS61283114A (ja) * | 1985-06-10 | 1986-12-13 | Toshiba Mach Co Ltd | プラズマcvd装置 |
JPS62260065A (ja) * | 1986-04-04 | 1987-11-12 | Canon Inc | 酸化すず薄膜の形成法 |
-
1977
- 1977-02-16 JP JP1498277A patent/JPS53101276A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5714287U (ja) * | 1980-06-24 | 1982-01-25 | ||
JPS5785220A (en) * | 1980-11-18 | 1982-05-27 | Fujitsu Ltd | Plasma cvd device |
JPS5948535B2 (ja) * | 1980-11-18 | 1984-11-27 | 富士通株式会社 | プラズマcvd装置 |
JPS58101421A (ja) * | 1981-12-11 | 1983-06-16 | Canon Inc | 堆積膜の製造装置 |
JPS6115976A (ja) * | 1984-07-03 | 1986-01-24 | Matsushita Electric Ind Co Ltd | プラズマ反応装置およびその使用方法 |
JPH0355552B2 (ja) * | 1984-07-03 | 1991-08-23 | ||
JPS61283114A (ja) * | 1985-06-10 | 1986-12-13 | Toshiba Mach Co Ltd | プラズマcvd装置 |
JPS62260065A (ja) * | 1986-04-04 | 1987-11-12 | Canon Inc | 酸化すず薄膜の形成法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6228569B2 (ja) | 1987-06-22 |
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