JPS5285081A - Gas phase reaction apparatus - Google Patents

Gas phase reaction apparatus

Info

Publication number
JPS5285081A
JPS5285081A JP155676A JP155676A JPS5285081A JP S5285081 A JPS5285081 A JP S5285081A JP 155676 A JP155676 A JP 155676A JP 155676 A JP155676 A JP 155676A JP S5285081 A JPS5285081 A JP S5285081A
Authority
JP
Japan
Prior art keywords
phase reaction
gas phase
reaction apparatus
gas
small size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP155676A
Other languages
Japanese (ja)
Inventor
Masakuni Akiba
Yukio Misonoo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP155676A priority Critical patent/JPS5285081A/en
Publication of JPS5285081A publication Critical patent/JPS5285081A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To provide a gas phase reaction apparatus capable of preventing invasion of surrounding gas or the reaction gas of the adjacent gas phase reaction chamber into said apparatus having a small size gas barrier.
JP155676A 1976-01-09 1976-01-09 Gas phase reaction apparatus Pending JPS5285081A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP155676A JPS5285081A (en) 1976-01-09 1976-01-09 Gas phase reaction apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP155676A JPS5285081A (en) 1976-01-09 1976-01-09 Gas phase reaction apparatus

Publications (1)

Publication Number Publication Date
JPS5285081A true JPS5285081A (en) 1977-07-15

Family

ID=11504789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP155676A Pending JPS5285081A (en) 1976-01-09 1976-01-09 Gas phase reaction apparatus

Country Status (1)

Country Link
JP (1) JPS5285081A (en)

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