JPS53101276A - Decompression cvd device - Google Patents

Decompression cvd device

Info

Publication number
JPS53101276A
JPS53101276A JP1498277A JP1498277A JPS53101276A JP S53101276 A JPS53101276 A JP S53101276A JP 1498277 A JP1498277 A JP 1498277A JP 1498277 A JP1498277 A JP 1498277A JP S53101276 A JPS53101276 A JP S53101276A
Authority
JP
Japan
Prior art keywords
cvd device
decompression cvd
decompression
pressure
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1498277A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6228569B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Katsuo Sugawara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1498277A priority Critical patent/JPS53101276A/ja
Publication of JPS53101276A publication Critical patent/JPS53101276A/ja
Publication of JPS6228569B2 publication Critical patent/JPS6228569B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP1498277A 1977-02-16 1977-02-16 Decompression cvd device Granted JPS53101276A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1498277A JPS53101276A (en) 1977-02-16 1977-02-16 Decompression cvd device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1498277A JPS53101276A (en) 1977-02-16 1977-02-16 Decompression cvd device

Publications (2)

Publication Number Publication Date
JPS53101276A true JPS53101276A (en) 1978-09-04
JPS6228569B2 JPS6228569B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-06-22

Family

ID=11876161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1498277A Granted JPS53101276A (en) 1977-02-16 1977-02-16 Decompression cvd device

Country Status (1)

Country Link
JP (1) JPS53101276A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5714287U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1980-06-24 1982-01-25
JPS5785220A (en) * 1980-11-18 1982-05-27 Fujitsu Ltd Plasma cvd device
JPS58101421A (ja) * 1981-12-11 1983-06-16 Canon Inc 堆積膜の製造装置
JPS6115976A (ja) * 1984-07-03 1986-01-24 Matsushita Electric Ind Co Ltd プラズマ反応装置およびその使用方法
JPS61283114A (ja) * 1985-06-10 1986-12-13 Toshiba Mach Co Ltd プラズマｃｖｄ装置
JPS62260065A (ja) * 1986-04-04 1987-11-12 Canon Inc 酸化すず薄膜の形成法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5714287U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1980-06-24 1982-01-25
JPS5785220A (en) * 1980-11-18 1982-05-27 Fujitsu Ltd Plasma cvd device
JPS58101421A (ja) * 1981-12-11 1983-06-16 Canon Inc 堆積膜の製造装置
JPS6115976A (ja) * 1984-07-03 1986-01-24 Matsushita Electric Ind Co Ltd プラズマ反応装置およびその使用方法
JPS61283114A (ja) * 1985-06-10 1986-12-13 Toshiba Mach Co Ltd プラズマｃｖｄ装置
JPS62260065A (ja) * 1986-04-04 1987-11-12 Canon Inc 酸化すず薄膜の形成法

Also Published As

Publication number Publication date
JPS6228569B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-06-22

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