JPS5259124A - Photopolymerizable unsaturated ketones and process for preparation thereof - Google Patents

Photopolymerizable unsaturated ketones and process for preparation thereof

Info

Publication number
JPS5259124A
JPS5259124A JP13275476A JP13275476A JPS5259124A JP S5259124 A JPS5259124 A JP S5259124A JP 13275476 A JP13275476 A JP 13275476A JP 13275476 A JP13275476 A JP 13275476A JP S5259124 A JPS5259124 A JP S5259124A
Authority
JP
Japan
Prior art keywords
preparation
photopolymerizable unsaturated
unsaturated ketones
ketones
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13275476A
Other languages
English (en)
Inventor
Edowaado Guriin Jiyooji
Piitaa Sutaaku Baanaado
Shidonii Uootaahausu Jiyon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS5259124A publication Critical patent/JPS5259124A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02—Polycondensates containing more than one epoxy group per molecule
    • C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
    • C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
    • C08G59/066—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols with chain extension or advancing agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Epoxy Resins (AREA)
  • Epoxy Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Furan Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP13275476A 1975-11-04 1976-11-04 Photopolymerizable unsaturated ketones and process for preparation thereof Pending JPS5259124A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4573575A GB1512969A (en) 1975-11-04 1975-11-04 Photopolymerisable ketones

Publications (1)

Publication Number Publication Date
JPS5259124A true JPS5259124A (en) 1977-05-16

Family

ID=10438370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13275476A Pending JPS5259124A (en) 1975-11-04 1976-11-04 Photopolymerizable unsaturated ketones and process for preparation thereof

Country Status (7)

Country Link
US (1) US4111907A (ja)
JP (1) JPS5259124A (ja)
CA (1) CA1084517A (ja)
CH (1) CH630396A5 (ja)
DE (1) DE2649926A1 (ja)
FR (1) FR2330709A1 (ja)
GB (1) GB1512969A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010047728A (ja) * 2008-08-25 2010-03-04 Nippon Steel Chem Co Ltd エポキシ樹脂組成物および成形物

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT376894B (de) * 1982-12-16 1985-01-10 Tyrolia Freizeitgeraete Ausloeseskibindung
DE3331296A1 (de) * 1983-08-31 1985-03-14 Hoechst Ag, 6230 Frankfurt Mono- und bisfunktionelle anthrachinon-(oxy-2,3-oxidopropane), verfahren zu ihrer herstellung und ihre verwendung
DE3578421D1 (de) * 1984-04-04 1990-08-02 Ciba Geigy Ag Glycidyloxydiketone.

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3410824A (en) * 1965-03-19 1968-11-12 Ralph B. Atkinson Light sensitive resin from a dihydroxy chalcone and an epoxy prepolymer
BE794087A (nl) * 1972-01-21 1973-07-16 Shell Int Research Polyepoxyden
DE2256947A1 (de) * 1972-11-21 1974-05-22 Reichhold Albert Chemie Ag Neue polyglycidylaether
GB1464287A (en) * 1974-02-22 1977-02-09 Ciba Geigy Ag Polymerisable esters

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010047728A (ja) * 2008-08-25 2010-03-04 Nippon Steel Chem Co Ltd エポキシ樹脂組成物および成形物

Also Published As

Publication number Publication date
CH630396A5 (de) 1982-06-15
FR2330709A1 (fr) 1977-06-03
FR2330709B1 (ja) 1978-05-05
CA1084517A (en) 1980-08-26
DE2649926A1 (de) 1977-05-12
US4111907A (en) 1978-09-05
GB1512969A (en) 1978-06-01

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