JPS5248061B2 - - Google Patents
Info
- Publication number
- JPS5248061B2 JPS5248061B2 JP49089915A JP8991574A JPS5248061B2 JP S5248061 B2 JPS5248061 B2 JP S5248061B2 JP 49089915 A JP49089915 A JP 49089915A JP 8991574 A JP8991574 A JP 8991574A JP S5248061 B2 JPS5248061 B2 JP S5248061B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US398734A US3866013A (en) | 1973-09-19 | 1973-09-19 | Method and apparatus for controlling movable means such as an electron beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5058986A JPS5058986A (enExample) | 1975-05-22 |
| JPS5248061B2 true JPS5248061B2 (enExample) | 1977-12-07 |
Family
ID=23576583
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49089915A Expired JPS5248061B2 (enExample) | 1973-09-19 | 1974-08-07 | |
| JP5274177A Granted JPS5333584A (en) | 1973-09-19 | 1977-05-10 | Device for controlling charged beam |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5274177A Granted JPS5333584A (en) | 1973-09-19 | 1977-05-10 | Device for controlling charged beam |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3866013A (enExample) |
| JP (2) | JPS5248061B2 (enExample) |
| CA (1) | CA1013074A (enExample) |
| DE (1) | DE2443625C2 (enExample) |
| FR (1) | FR2244202B1 (enExample) |
| GB (1) | GB1438737A (enExample) |
| IT (1) | IT1020326B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5778814U (enExample) * | 1980-10-31 | 1982-05-15 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2294489A1 (fr) * | 1974-12-13 | 1976-07-09 | Thomson Csf | Dispositif pour le trace programme de dessins par bombardement de particules |
| US4056730A (en) * | 1976-07-12 | 1977-11-01 | International Business Machines Corporation | Apparatus for detecting registration marks on a target such as a semiconductor wafer |
| US4099062A (en) * | 1976-12-27 | 1978-07-04 | International Business Machines Corporation | Electron beam lithography process |
| US4147937A (en) * | 1977-11-01 | 1979-04-03 | Fujitsu Limited | Electron beam exposure system method and apparatus |
| JPS5511303A (en) * | 1978-07-10 | 1980-01-26 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron-beam exposure device |
| JPS5521156A (en) * | 1978-08-02 | 1980-02-15 | Fujitsu Ltd | Electronic beam exposing system |
| DE102014105452B3 (de) * | 2014-04-16 | 2015-08-27 | Von Ardenne Gmbh | Anordnung zum Ablenken eines mittels einer Elektronenstrahlkanone erzeugten Elektronenstrahls, Verfahren zum Erzeugen eines Ablenksignals und Verfahren zum Betreiben einer Elektronenstrahlkanone |
| DE102014105451B3 (de) * | 2014-04-16 | 2015-08-27 | Von Ardenne Gmbh | Anordnung zum Ablenken eines mittels einer Elektronenstrahlkanone erzeugten Elektronenstrahls, Verfahren zum Erzeugen eines Ablenksignals und Verfahren zum Betreiben einer Elektronenstrahlkanone |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| US3789185A (en) * | 1969-12-15 | 1974-01-29 | Ibm | Electron beam deflection control apparatus |
-
1973
- 1973-09-19 US US398734A patent/US3866013A/en not_active Expired - Lifetime
-
1974
- 1974-08-02 FR FR7427488A patent/FR2244202B1/fr not_active Expired
- 1974-08-07 JP JP49089915A patent/JPS5248061B2/ja not_active Expired
- 1974-08-19 GB GB3634674A patent/GB1438737A/en not_active Expired
- 1974-08-22 CA CA207,581A patent/CA1013074A/en not_active Expired
- 1974-08-30 IT IT26771/74A patent/IT1020326B/it active
- 1974-09-12 DE DE2443625A patent/DE2443625C2/de not_active Expired
-
1977
- 1977-05-10 JP JP5274177A patent/JPS5333584A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5778814U (enExample) * | 1980-10-31 | 1982-05-15 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2244202B1 (enExample) | 1976-10-22 |
| FR2244202A1 (enExample) | 1975-04-11 |
| DE2443625A1 (de) | 1975-03-20 |
| DE2443625C2 (de) | 1983-10-27 |
| GB1438737A (en) | 1976-06-09 |
| JPS5058986A (enExample) | 1975-05-22 |
| IT1020326B (it) | 1977-12-20 |
| US3866013A (en) | 1975-02-11 |
| CA1013074A (en) | 1977-06-28 |
| JPS5328749B2 (enExample) | 1978-08-16 |
| JPS5333584A (en) | 1978-03-29 |