JPS5248060B2 - - Google Patents

Info

Publication number
JPS5248060B2
JPS5248060B2 JP49056794A JP5679474A JPS5248060B2 JP S5248060 B2 JPS5248060 B2 JP S5248060B2 JP 49056794 A JP49056794 A JP 49056794A JP 5679474 A JP5679474 A JP 5679474A JP S5248060 B2 JPS5248060 B2 JP S5248060B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49056794A
Other languages
Japanese (ja)
Other versions
JPS5023782A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5023782A publication Critical patent/JPS5023782A/ja
Publication of JPS5248060B2 publication Critical patent/JPS5248060B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Radar Systems Or Details Thereof (AREA)
JP49056794A 1973-06-08 1974-05-22 Expired JPS5248060B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US368384A US3924113A (en) 1973-06-08 1973-06-08 Electron beam registration system

Publications (2)

Publication Number Publication Date
JPS5023782A JPS5023782A (en) 1975-03-14
JPS5248060B2 true JPS5248060B2 (en) 1977-12-07

Family

ID=23450995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49056794A Expired JPS5248060B2 (en) 1973-06-08 1974-05-22

Country Status (7)

Country Link
US (1) US3924113A (en)
JP (1) JPS5248060B2 (en)
CA (1) CA1009766A (en)
DE (1) DE2424313C2 (en)
FR (1) FR2240484B1 (en)
GB (1) GB1427695A (en)
IT (1) IT1010161B (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2320665A1 (en) * 1975-08-04 1977-03-04 Telecommunications Sa IMPROVEMENTS TO ELECTROMECHANICAL FREQUENCY BAND PASS FILTERS
JPS5315076A (en) * 1976-07-28 1978-02-10 Nippon Telegr & Teleph Corp <Ntt> Electron beam position detection method
JPS5319764A (en) * 1976-08-09 1978-02-23 Nippon Telegr & Teleph Corp <Ntt> Mark detection system in electron beam exposure
DE2702448C2 (en) * 1977-01-20 1982-12-16 Siemens AG, 1000 Berlin und 8000 München Method for positioning a workpiece provided with a mark relative to a scanning field or to a mask
DE2846316A1 (en) * 1978-10-24 1980-06-04 Siemens Ag Automatic mask aligning system for semiconductor prodn. - uses opto-electronic scanner for grids on mask and silicon wafer, with results integrated and averaged as to intensity distributions
JPS6058793B2 (en) * 1980-03-24 1985-12-21 日電アネルバ株式会社 Plasma spectroscopic monitoring device
JPS57106130A (en) * 1980-12-24 1982-07-01 Jeol Ltd Detecting method for mark
US4387433A (en) * 1980-12-24 1983-06-07 International Business Machines Corporation High speed data interface buffer for digitally controlled electron beam exposure system
JPS57122517A (en) * 1981-01-22 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Alignment mark detector for electron beam exposure
JPS58122725A (en) * 1982-01-14 1983-07-21 Nippon Telegr & Teleph Corp <Ntt> Beam shape measuring apparatus
US4546260A (en) * 1983-06-30 1985-10-08 International Business Machines Corporation Alignment technique
FR2586506B1 (en) * 1985-08-20 1988-01-29 Primat Didier OPTICAL AND ELECTRONIC METHOD AND DEVICE FOR PROVIDING AUTOMATIC CUTTING OF PLATES
US4803644A (en) * 1985-09-20 1989-02-07 Hughes Aircraft Company Alignment mark detector for electron beam lithography
DE3735154C2 (en) * 1986-10-17 1994-10-20 Canon Kk Method for detecting the position of a mark provided on an object
JPH0724256B2 (en) * 1987-08-13 1995-03-15 日本電子株式会社 Size measuring device
US10566169B1 (en) 2008-06-30 2020-02-18 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US10991545B2 (en) 2008-06-30 2021-04-27 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
DE102015117693A1 (en) * 2015-10-16 2017-04-20 Ald Vacuum Technologies Gmbh Method for determining the changing position of the impact point of an energetic beam on a limited area

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3328795A (en) * 1959-11-18 1967-06-27 Ling Temco Vought Inc Fixtaking means and method
US3329813A (en) * 1964-08-25 1967-07-04 Jeol Ltd Backscatter electron analysis apparatus to determine elemental content or surface topography of a specimen
US3535516A (en) * 1966-10-17 1970-10-20 Hitachi Ltd Electron microscope employing a modulated scanning beam and a phase sensitive detector to improve the signal to noise ratio
US3614736A (en) * 1968-05-21 1971-10-19 Ibm Pattern recognition apparatus and methods invariant to translation, scale change and rotation
US3646333A (en) * 1969-12-12 1972-02-29 Us Navy Digital correlator and integrator
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3745317A (en) * 1970-05-04 1973-07-10 Commissariat Energie Atomique System for generating the fourier transform of a function
US3644899A (en) * 1970-07-29 1972-02-22 Cogar Corp Method for determining partial memory chip categories
US3717756A (en) * 1970-10-30 1973-02-20 Electronic Communications High precision circulating digital correlator
US3777133A (en) * 1971-01-26 1973-12-04 C Wormald Cross correlator
CA953010A (en) * 1971-12-03 1974-08-13 Her Majesty In Right Of Canada As Represented By The Minister Of Transpo Rt Radar cross correlator
US3718813A (en) * 1972-01-19 1973-02-27 O Williams Technique for correlation method of determining system impulse response

Also Published As

Publication number Publication date
US3924113A (en) 1975-12-02
CA1009766A (en) 1977-05-03
GB1427695A (en) 1976-03-10
DE2424313C2 (en) 1984-03-01
FR2240484A1 (en) 1975-03-07
IT1010161B (en) 1977-01-10
FR2240484B1 (en) 1976-06-25
DE2424313A1 (en) 1975-01-02
JPS5023782A (en) 1975-03-14

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