JPS5241050B2 - - Google Patents

Info

Publication number
JPS5241050B2
JPS5241050B2 JP49034285A JP3428574A JPS5241050B2 JP S5241050 B2 JPS5241050 B2 JP S5241050B2 JP 49034285 A JP49034285 A JP 49034285A JP 3428574 A JP3428574 A JP 3428574A JP S5241050 B2 JPS5241050 B2 JP S5241050B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49034285A
Other languages
Japanese (ja)
Other versions
JPS50127619A (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP49034285A priority Critical patent/JPS5241050B2/ja
Publication of JPS50127619A publication Critical patent/JPS50127619A/ja
Publication of JPS5241050B2 publication Critical patent/JPS5241050B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
JP49034285A 1974-03-27 1974-03-27 Expired JPS5241050B2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP49034285A JPS5241050B2 (fr) 1974-03-27 1974-03-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49034285A JPS5241050B2 (fr) 1974-03-27 1974-03-27

Publications (2)

Publication Number Publication Date
JPS50127619A JPS50127619A (fr) 1975-10-07
JPS5241050B2 true JPS5241050B2 (fr) 1977-10-15

Family

ID=12409874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49034285A Expired JPS5241050B2 (fr) 1974-03-27 1974-03-27

Country Status (1)

Country Link
JP (1) JPS5241050B2 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51120712A (en) * 1975-04-15 1976-10-22 Toshiba Corp Positive type photo-resistant compound
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
JPS6161154A (ja) * 1984-09-03 1986-03-28 Oki Electric Ind Co Ltd 微細ネガレジストパターン形成方法
JPH0766184B2 (ja) * 1985-06-04 1995-07-19 住友化学工業株式会社 ポジ型フオトレジスト組成物
JP2549366B2 (ja) * 1986-10-03 1996-10-30 三菱化学株式会社 感光性平版印刷版
JPS6452139A (en) * 1987-05-18 1989-02-28 Konishiroku Photo Ind Photosensitive composition
JP2551948B2 (ja) * 1987-07-31 1996-11-06 三菱化学株式会社 感光性平版印刷版
JP2693472B2 (ja) * 1987-11-26 1997-12-24 株式会社東芝 レジスト
WO1989005475A1 (fr) * 1987-12-10 1989-06-15 Macdermid, Incorporated Agent de photoreserve pour film sec a image reversible

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7305260A (fr) * 1972-05-05 1973-11-07

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7305260A (fr) * 1972-05-05 1973-11-07
JPS4948403A (fr) * 1972-05-05 1974-05-10

Also Published As

Publication number Publication date
JPS50127619A (fr) 1975-10-07

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