JPS5239380A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5239380A
JPS5239380A JP50115762A JP11576275A JPS5239380A JP S5239380 A JPS5239380 A JP S5239380A JP 50115762 A JP50115762 A JP 50115762A JP 11576275 A JP11576275 A JP 11576275A JP S5239380 A JPS5239380 A JP S5239380A
Authority
JP
Japan
Prior art keywords
semiconductor device
pnpn
preparing
region
embedded layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50115762A
Other languages
Japanese (ja)
Inventor
Toru Kuwabara
Mikio Kyomasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP50115762A priority Critical patent/JPS5239380A/en
Publication of JPS5239380A publication Critical patent/JPS5239380A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H01L27/0921Means for preventing a bipolar, e.g. thyristor, action between the different transistor regions, e.g. Latchup prevention

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To prevent latch up phenomena existing in pnpn-type CMOS by preparing p<+> embedded layer on the bottom of P<-> region.
JP50115762A 1975-09-25 1975-09-25 Semiconductor device Pending JPS5239380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50115762A JPS5239380A (en) 1975-09-25 1975-09-25 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50115762A JPS5239380A (en) 1975-09-25 1975-09-25 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5239380A true JPS5239380A (en) 1977-03-26

Family

ID=14670403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50115762A Pending JPS5239380A (en) 1975-09-25 1975-09-25 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5239380A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5493981A (en) * 1978-01-09 1979-07-25 Toshiba Corp Semiconductor device
JPS57188863A (en) * 1981-05-18 1982-11-19 Hitachi Ltd Field effect type semiconductor device
JPS57206063A (en) * 1981-06-15 1982-12-17 Toshiba Corp Semiconductor substrate and manufacture therefor
JPS58182863A (en) * 1982-04-21 1983-10-25 Hitachi Ltd Semiconductor device
JPS59132647A (en) * 1983-01-19 1984-07-30 Toshiba Corp Semiconductor device
JPS60140748A (en) * 1983-12-27 1985-07-25 Rohm Co Ltd Semiconductor device
US5212440A (en) * 1990-05-14 1993-05-18 Micron Technology, Inc. Quick response CMOS voltage reference circuit

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5493981A (en) * 1978-01-09 1979-07-25 Toshiba Corp Semiconductor device
JPS57188863A (en) * 1981-05-18 1982-11-19 Hitachi Ltd Field effect type semiconductor device
JPS57206063A (en) * 1981-06-15 1982-12-17 Toshiba Corp Semiconductor substrate and manufacture therefor
JPS58182863A (en) * 1982-04-21 1983-10-25 Hitachi Ltd Semiconductor device
JPH0481341B2 (en) * 1982-04-21 1992-12-22 Hitachi Ltd
JPS59132647A (en) * 1983-01-19 1984-07-30 Toshiba Corp Semiconductor device
JPS60140748A (en) * 1983-12-27 1985-07-25 Rohm Co Ltd Semiconductor device
US5212440A (en) * 1990-05-14 1993-05-18 Micron Technology, Inc. Quick response CMOS voltage reference circuit

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