JPS5238879A - Particle beam device - Google Patents

Particle beam device

Info

Publication number
JPS5238879A
JPS5238879A JP51109740A JP10974076A JPS5238879A JP S5238879 A JPS5238879 A JP S5238879A JP 51109740 A JP51109740 A JP 51109740A JP 10974076 A JP10974076 A JP 10974076A JP S5238879 A JPS5238879 A JP S5238879A
Authority
JP
Japan
Prior art keywords
particle beam
beam device
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP51109740A
Other languages
English (en)
Inventor
Miyuraa Karuruhaintsu
Miyunhimaiyaa Warutaa
Fuon Raufu Mooritsu
Shieefuaa Nooberuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS5238879A publication Critical patent/JPS5238879A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Control Of Position Or Direction (AREA)
JP51109740A 1975-09-19 1976-09-13 Particle beam device Pending JPS5238879A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752542360 DE2542360C2 (de) 1975-09-19 1975-09-19 Korpuskularstrahlgerät mit einem Goniometer

Publications (1)

Publication Number Publication Date
JPS5238879A true JPS5238879A (en) 1977-03-25

Family

ID=5957171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51109740A Pending JPS5238879A (en) 1975-09-19 1976-09-13 Particle beam device

Country Status (5)

Country Link
US (1) US4058731A (ja)
JP (1) JPS5238879A (ja)
DE (1) DE2542360C2 (ja)
GB (1) GB1518051A (ja)
NL (1) NL7610373A (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2744680C2 (de) * 1977-09-30 1979-11-22 Siemens Ag, 1000 Berlin Und 8000 Muenchen Korpuskularstrahloptisches Gerät mit einem in mindestens einem Lager sitzenden Objekthalter
US4170737A (en) * 1978-07-06 1979-10-09 Spetsialnoe Konstruktorskoe Bjuro Biologicheskogo Priborotroenia Akademii Nauk SSSR Top-entry transmission electron microscope
US4587431A (en) * 1983-04-22 1986-05-06 Jeol Ltd. Specimen manipulating mechanism for charged-particle beam instrument
DE3546095A1 (de) * 1985-12-24 1987-06-25 Zeiss Carl Fa Goniometertisch
DE3628170A1 (de) * 1986-08-20 1988-02-25 Max Planck Gesellschaft Verstellbare praeparathalterung fuer ein korpuskularstrahlenmikroskop
DE4140710A1 (de) * 1991-12-10 1993-06-17 Integrated Circuit Testing Positioniersystem
US5481111A (en) * 1994-01-03 1996-01-02 Philips Electronics North America Corporation Electron microscope having a goniometer controlled from the image frame of reference
JP3014274B2 (ja) * 1994-06-29 2000-02-28 株式会社日立製作所 ２軸傾斜試料微動装置及び像の逃げ補正方法
FR2737785B1 (fr) * 1995-08-11 1997-10-17 Matra Mhs Procede et dispositif de positionnement d'un objet par rapport au point de focalisation d'un microscope
DE19839871C2 (de) * 1998-09-02 2000-06-15 Dresden Ev Inst Festkoerper Manipulator zur Positionierung von Proben in Apparaturen und Kammern
US6740889B1 (en) * 1998-09-28 2004-05-25 Applied Materials, Inc. Charged particle beam microscope with minicolumn
US6690763B2 (en) 2001-04-28 2004-02-10 Oceaneering International, Inc. Device for micro-manipulation of small samples
FI20041538A (fi) * 2004-11-29 2006-05-30 Stresstech Oy Goniometri
JP4185062B2 (ja) * 2005-03-04 2008-11-19 エスアイアイ・ナノテクノロジー株式会社 加工用ステージ及び集束ビーム加工装置並びに集束ビーム加工方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1950320A1 (de) * 1969-09-30 1971-04-01 Siemens Ag Verfahren zum Kennzeichnen von Stellungen eines in Vakuumraum eines Korpuskularstrahlgeraetes verstellbar angeordneten Teiles
US3648048A (en) * 1969-10-15 1972-03-07 Thomson Houston Comp Francaise System and method for positioning a wafer coated with photoresist and for controlling the displacements of said wafer in a scanning electron apparatus
JPS4830860A (ja) * 1971-08-25 1973-04-23
US3952203A (en) * 1972-07-21 1976-04-20 Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. Object adjustment device for a charged particle beam apparatus

Also Published As

Publication number Publication date
GB1518051A (en) 1978-07-19
DE2542360C2 (de) 1977-11-17
US4058731A (en) 1977-11-15
NL7610373A (nl) 1977-03-22
DE2542360B1 (de) 1977-03-24

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