JPS5233074A - Surface treatment of printed circuit copper foil - Google Patents
Surface treatment of printed circuit copper foilInfo
- Publication number
- JPS5233074A JPS5233074A JP10899775A JP10899775A JPS5233074A JP S5233074 A JPS5233074 A JP S5233074A JP 10899775 A JP10899775 A JP 10899775A JP 10899775 A JP10899775 A JP 10899775A JP S5233074 A JPS5233074 A JP S5233074A
- Authority
- JP
- Japan
- Prior art keywords
- printed circuit
- surface treatment
- copper foil
- circuit copper
- foil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10899775A JPS5233074A (en) | 1975-09-10 | 1975-09-10 | Surface treatment of printed circuit copper foil |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10899775A JPS5233074A (en) | 1975-09-10 | 1975-09-10 | Surface treatment of printed circuit copper foil |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5233074A true JPS5233074A (en) | 1977-03-12 |
Family
ID=14498951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10899775A Pending JPS5233074A (en) | 1975-09-10 | 1975-09-10 | Surface treatment of printed circuit copper foil |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5233074A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5530818A (en) * | 1978-08-25 | 1980-03-04 | Mitsui Mining & Smelting Co | Method of surface treating printed circuit copper foil |
WO1991004358A1 (en) * | 1989-09-13 | 1991-04-04 | Gould, Inc. | Electrodeposited foil with controlled properties for printed circuit board applications and procedures and electrolyte bath solutions for preparing the same |
WO1991019024A1 (en) * | 1990-05-30 | 1991-12-12 | Gould, Inc. | Electrodeposited copper foil and process for making same using electrolyte solutions having low chloride ion concentrations |
US5403465A (en) * | 1990-05-30 | 1995-04-04 | Gould Inc. | Electrodeposited copper foil and process for making same using electrolyte solutions having controlled additions of chloride ions and organic additives |
US5431803A (en) * | 1990-05-30 | 1995-07-11 | Gould Electronics Inc. | Electrodeposited copper foil and process for making same |
US5958209A (en) * | 1996-05-13 | 1999-09-28 | Mitsui Mining & Smelting Co., Ltd. | High tensile strength electrodeposited copper foil and process of electrodepositing thereof |
-
1975
- 1975-09-10 JP JP10899775A patent/JPS5233074A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5530818A (en) * | 1978-08-25 | 1980-03-04 | Mitsui Mining & Smelting Co | Method of surface treating printed circuit copper foil |
JPS5641196B2 (en) * | 1978-08-25 | 1981-09-26 | ||
WO1991004358A1 (en) * | 1989-09-13 | 1991-04-04 | Gould, Inc. | Electrodeposited foil with controlled properties for printed circuit board applications and procedures and electrolyte bath solutions for preparing the same |
US5215645A (en) * | 1989-09-13 | 1993-06-01 | Gould Inc. | Electrodeposited foil with controlled properties for printed circuit board applications and procedures and electrolyte bath solutions for preparing the same |
CN1093179C (en) * | 1989-09-13 | 2002-10-23 | 古尔德有限公司 | Electrodeposited foil with controlled properties for printed circuit board applications and procedures and electrolyte bath solutions for preparing same |
WO1991019024A1 (en) * | 1990-05-30 | 1991-12-12 | Gould, Inc. | Electrodeposited copper foil and process for making same using electrolyte solutions having low chloride ion concentrations |
US5403465A (en) * | 1990-05-30 | 1995-04-04 | Gould Inc. | Electrodeposited copper foil and process for making same using electrolyte solutions having controlled additions of chloride ions and organic additives |
US5421985A (en) * | 1990-05-30 | 1995-06-06 | Gould Inc. | Electrodeposited copper foil and process for making same using electrolyte solutions having low chloride ion concentrations |
US5431803A (en) * | 1990-05-30 | 1995-07-11 | Gould Electronics Inc. | Electrodeposited copper foil and process for making same |
US5454926A (en) * | 1990-05-30 | 1995-10-03 | Gould Electronics Inc. | Electrodeposited copper foil |
US5958209A (en) * | 1996-05-13 | 1999-09-28 | Mitsui Mining & Smelting Co., Ltd. | High tensile strength electrodeposited copper foil and process of electrodepositing thereof |
US6194056B1 (en) | 1996-05-13 | 2001-02-27 | Mitsui Mining & Smelting Co., Ltd. | High tensile strength electrodeposited copper foil |
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