JPS52113168A - Electron beam exposing device - Google Patents

Electron beam exposing device

Info

Publication number
JPS52113168A
JPS52113168A JP2925376A JP2925376A JPS52113168A JP S52113168 A JPS52113168 A JP S52113168A JP 2925376 A JP2925376 A JP 2925376A JP 2925376 A JP2925376 A JP 2925376A JP S52113168 A JPS52113168 A JP S52113168A
Authority
JP
Japan
Prior art keywords
electron beam
exposing device
beam exposing
memory unit
correction data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2925376A
Other languages
Japanese (ja)
Other versions
JPS5319903B2 (en
Inventor
Tomoki Shiyudo
Yoshiyasu Kikuchi
Nobumasa Watanabe
Yoshihiro Kasuya
Kaoru Mokuen
Taido Uno
Hiroshi Oshiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
NEC Corp
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP2925376A priority Critical patent/JPS52113168A/en
Publication of JPS52113168A publication Critical patent/JPS52113168A/en
Publication of JPS5319903B2 publication Critical patent/JPS5319903B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To scan correction at high speed by storing the correction data measured in advance in a memory unit whereby the correction data with respect to the given beam position are obrained as desired by addressing the memory unit without any operation.
COPYRIGHT: (C)1977,JPO&Japio
JP2925376A 1976-03-19 1976-03-19 Electron beam exposing device Granted JPS52113168A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2925376A JPS52113168A (en) 1976-03-19 1976-03-19 Electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2925376A JPS52113168A (en) 1976-03-19 1976-03-19 Electron beam exposing device

Publications (2)

Publication Number Publication Date
JPS52113168A true JPS52113168A (en) 1977-09-22
JPS5319903B2 JPS5319903B2 (en) 1978-06-23

Family

ID=12271098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2925376A Granted JPS52113168A (en) 1976-03-19 1976-03-19 Electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS52113168A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105970A (en) * 1978-02-08 1979-08-20 Nippon Telegr & Teleph Corp <Ntt> Electron beam drawing device and its use

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105970A (en) * 1978-02-08 1979-08-20 Nippon Telegr & Teleph Corp <Ntt> Electron beam drawing device and its use

Also Published As

Publication number Publication date
JPS5319903B2 (en) 1978-06-23

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