JPS52100234A - Stripping solution of photosolubilizable light sensitive resin - Google Patents

Stripping solution of photosolubilizable light sensitive resin

Info

Publication number
JPS52100234A
JPS52100234A JP1738876A JP1738876A JPS52100234A JP S52100234 A JPS52100234 A JP S52100234A JP 1738876 A JP1738876 A JP 1738876A JP 1738876 A JP1738876 A JP 1738876A JP S52100234 A JPS52100234 A JP S52100234A
Authority
JP
Japan
Prior art keywords
photosolubilizable
light sensitive
sensitive resin
stripping solution
aqueous solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1738876A
Other languages
English (en)
Japanese (ja)
Other versions
JPS576579B2 (enExample
Inventor
Hiroshi Yamanoi
Akira Kamihira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP1738876A priority Critical patent/JPS52100234A/ja
Publication of JPS52100234A publication Critical patent/JPS52100234A/ja
Publication of JPS576579B2 publication Critical patent/JPS576579B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1738876A 1976-02-19 1976-02-19 Stripping solution of photosolubilizable light sensitive resin Granted JPS52100234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1738876A JPS52100234A (en) 1976-02-19 1976-02-19 Stripping solution of photosolubilizable light sensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1738876A JPS52100234A (en) 1976-02-19 1976-02-19 Stripping solution of photosolubilizable light sensitive resin

Publications (2)

Publication Number Publication Date
JPS52100234A true JPS52100234A (en) 1977-08-23
JPS576579B2 JPS576579B2 (enExample) 1982-02-05

Family

ID=11942605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1738876A Granted JPS52100234A (en) 1976-02-19 1976-02-19 Stripping solution of photosolubilizable light sensitive resin

Country Status (1)

Country Link
JP (1) JPS52100234A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57186330A (en) * 1981-05-12 1982-11-16 Matsushita Electronics Corp Removing method for photoresist
JPS5865432A (ja) * 1981-08-21 1983-04-19 ゼネラル・エレクトリツク・カンパニイ ポリメチルメタクリレ−トのエツチング法
WO1994008276A1 (en) * 1992-09-28 1994-04-14 Ducoa L.P. Photoresist stripping process using n,n-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide
CN109388036A (zh) * 2017-08-03 2019-02-26 无锡华瑛微电子技术有限公司 一种光刻胶的去除液及光刻胶的去除方法
EP3663857A4 (en) * 2017-08-03 2020-09-09 Huaying Research Co., Ltd SOLUTION FOR RELEASE OF PHOTO LACQUER AND PROCESS FOR RELEASE OF PHOTO LACQUER

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57186330A (en) * 1981-05-12 1982-11-16 Matsushita Electronics Corp Removing method for photoresist
JPS5865432A (ja) * 1981-08-21 1983-04-19 ゼネラル・エレクトリツク・カンパニイ ポリメチルメタクリレ−トのエツチング法
WO1994008276A1 (en) * 1992-09-28 1994-04-14 Ducoa L.P. Photoresist stripping process using n,n-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide
CN109388036A (zh) * 2017-08-03 2019-02-26 无锡华瑛微电子技术有限公司 一种光刻胶的去除液及光刻胶的去除方法
EP3663857A4 (en) * 2017-08-03 2020-09-09 Huaying Research Co., Ltd SOLUTION FOR RELEASE OF PHOTO LACQUER AND PROCESS FOR RELEASE OF PHOTO LACQUER
US11448966B2 (en) 2017-08-03 2022-09-20 Huaying Research Co., Ltd Photoresist-removing liquid and photoresist-removing method

Also Published As

Publication number Publication date
JPS576579B2 (enExample) 1982-02-05

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