JPS5189387A - - Google Patents

Info

Publication number
JPS5189387A
JPS5189387A JP50014738A JP1473875A JPS5189387A JP S5189387 A JPS5189387 A JP S5189387A JP 50014738 A JP50014738 A JP 50014738A JP 1473875 A JP1473875 A JP 1473875A JP S5189387 A JPS5189387 A JP S5189387A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50014738A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP50014738A priority Critical patent/JPS5189387A/ja
Publication of JPS5189387A publication Critical patent/JPS5189387A/ja
Pending legal-status Critical Current

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Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP50014738A 1975-02-03 1975-02-03 Pending JPS5189387A (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50014738A JPS5189387A (enrdf_load_stackoverflow) 1975-02-03 1975-02-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50014738A JPS5189387A (enrdf_load_stackoverflow) 1975-02-03 1975-02-03

Publications (1)

Publication Number Publication Date
JPS5189387A true JPS5189387A (enrdf_load_stackoverflow) 1976-08-05

Family

ID=11869451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50014738A Pending JPS5189387A (enrdf_load_stackoverflow) 1975-02-03 1975-02-03

Country Status (1)

Country Link
JP (1) JPS5189387A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS538953U (enrdf_load_stackoverflow) * 1976-07-07 1978-01-25
JPS5559723A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Plasma etching method
JPS57137472A (en) * 1981-02-17 1982-08-25 Nec Corp Etching method for polycrystalline silicon
JPS5928156A (ja) * 1982-12-29 1984-02-14 Konishiroku Photo Ind Co Ltd 露光マスクの製造方法
JPS63199428A (ja) * 1987-02-16 1988-08-17 Nippon Telegr & Teleph Corp <Ntt> 光ドライエツチング装置及び方法
JPH01226158A (ja) * 1988-03-07 1989-09-08 Toshiba Corp 半導体装置の製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS538953U (enrdf_load_stackoverflow) * 1976-07-07 1978-01-25
JPS5559723A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Plasma etching method
JPS57137472A (en) * 1981-02-17 1982-08-25 Nec Corp Etching method for polycrystalline silicon
JPS5928156A (ja) * 1982-12-29 1984-02-14 Konishiroku Photo Ind Co Ltd 露光マスクの製造方法
JPS63199428A (ja) * 1987-02-16 1988-08-17 Nippon Telegr & Teleph Corp <Ntt> 光ドライエツチング装置及び方法
JPH01226158A (ja) * 1988-03-07 1989-09-08 Toshiba Corp 半導体装置の製造方法

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