JPS5188182A - - Google Patents
Info
- Publication number
- JPS5188182A JPS5188182A JP50013233A JP1323375A JPS5188182A JP S5188182 A JPS5188182 A JP S5188182A JP 50013233 A JP50013233 A JP 50013233A JP 1323375 A JP1323375 A JP 1323375A JP S5188182 A JPS5188182 A JP S5188182A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1323375A JPS5324303B2 (enrdf_load_stackoverflow) | 1975-01-31 | 1975-01-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1323375A JPS5324303B2 (enrdf_load_stackoverflow) | 1975-01-31 | 1975-01-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5188182A true JPS5188182A (enrdf_load_stackoverflow) | 1976-08-02 |
| JPS5324303B2 JPS5324303B2 (enrdf_load_stackoverflow) | 1978-07-20 |
Family
ID=11827457
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1323375A Expired JPS5324303B2 (enrdf_load_stackoverflow) | 1975-01-31 | 1975-01-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5324303B2 (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58175832A (ja) * | 1983-03-07 | 1983-10-15 | Hitachi Ltd | プラズマ処理装置 |
| JPS6196732A (ja) * | 1984-10-12 | 1986-05-15 | アメリカン テレフオン アンド テレグラフ カムパニー | デバイス製造方法 |
| JPH08172078A (ja) * | 1995-07-25 | 1996-07-02 | Tokyo Ohka Kogyo Co Ltd | プラズマ反応処理装置 |
| US5733405A (en) * | 1995-02-13 | 1998-03-31 | Mitsubishi Denki Kabushiki Kaisha | Plasma processing apparatus |
| US6076483A (en) * | 1997-03-27 | 2000-06-20 | Mitsubishi Denki Kabushiki Kaisha | Plasma processing apparatus using a partition panel |
| US6167835B1 (en) | 1997-03-27 | 2001-01-02 | Mitsubishi Denki Kabushiki Kaisha | Two chamber plasma processing apparatus |
| JP2005149956A (ja) * | 2003-11-17 | 2005-06-09 | Ulvac Japan Ltd | 大面積高均一プラズマ処理方法及び装置 |
-
1975
- 1975-01-31 JP JP1323375A patent/JPS5324303B2/ja not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58175832A (ja) * | 1983-03-07 | 1983-10-15 | Hitachi Ltd | プラズマ処理装置 |
| JPS6196732A (ja) * | 1984-10-12 | 1986-05-15 | アメリカン テレフオン アンド テレグラフ カムパニー | デバイス製造方法 |
| US5733405A (en) * | 1995-02-13 | 1998-03-31 | Mitsubishi Denki Kabushiki Kaisha | Plasma processing apparatus |
| JPH08172078A (ja) * | 1995-07-25 | 1996-07-02 | Tokyo Ohka Kogyo Co Ltd | プラズマ反応処理装置 |
| US6076483A (en) * | 1997-03-27 | 2000-06-20 | Mitsubishi Denki Kabushiki Kaisha | Plasma processing apparatus using a partition panel |
| US6167835B1 (en) | 1997-03-27 | 2001-01-02 | Mitsubishi Denki Kabushiki Kaisha | Two chamber plasma processing apparatus |
| JP2005149956A (ja) * | 2003-11-17 | 2005-06-09 | Ulvac Japan Ltd | 大面積高均一プラズマ処理方法及び装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5324303B2 (enrdf_load_stackoverflow) | 1978-07-20 |