JPS5184640A - - Google Patents

Info

Publication number
JPS5184640A
JPS5184640A JP50132206A JP13220675A JPS5184640A JP S5184640 A JPS5184640 A JP S5184640A JP 50132206 A JP50132206 A JP 50132206A JP 13220675 A JP13220675 A JP 13220675A JP S5184640 A JPS5184640 A JP S5184640A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50132206A
Other versions
JPS5845693B2 (ja
Inventor
Gipusutein Edowaado
Emu Moryuu Uein
Yuu Niido Saado Omaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5184640A publication Critical patent/JPS5184640A/ja
Publication of JPS5845693B2 publication Critical patent/JPS5845693B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143Electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
JP50132206A 1974-12-20 1975-11-05 ゾウケイセイホウホウ Expired JPS5845693B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/534,542 US3985915A (en) 1974-12-20 1974-12-20 Use of nitrocellulose containing 10.5 to 12% nitrogen as electron beam positive resists

Publications (2)

Publication Number Publication Date
JPS5184640A true JPS5184640A (ja) 1976-07-24
JPS5845693B2 JPS5845693B2 (ja) 1983-10-12

Family

ID=24130514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50132206A Expired JPS5845693B2 (ja) 1974-12-20 1975-11-05 ゾウケイセイホウホウ

Country Status (5)

Country Link
US (1) US3985915A (ja)
JP (1) JPS5845693B2 (ja)
DE (1) DE2553519A1 (ja)
FR (1) FR2295466A1 (ja)
GB (1) GB1476289A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55106453A (en) * 1979-02-08 1980-08-15 Inst Opusuchiei I Neoruganichi Photograph material
JPS61256348A (ja) * 1985-05-10 1986-11-13 Nec Corp エネルギ−感応性樹脂

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3045519C2 (de) * 1980-12-03 1983-07-28 Franz Dr. 7317 Wendlingen Hasselbach Verfahren zur Erzeugung von mikroskopischen Reliefmustern
US4582776A (en) * 1981-10-09 1986-04-15 Pioneer Electronic Corporation Information recording disc having light absorbing cellulose nitrate coating
US4837125A (en) * 1986-03-25 1989-06-06 Siemens Aktiengesellschaft Electron-beam-sensitive resist material for microstructures in electronics
JP2001106785A (ja) * 1999-08-05 2001-04-17 Canon Inc 感光性樹脂及び該感光性樹脂を用いたレジスト組成物、該レジスト組成物を用いたパターン形成方法、該パターン形成方法により製造されるデバイス及び該感光性樹脂を有するレジストを用いた露光方法
FR3034881B1 (fr) * 2015-04-09 2017-05-05 Univ Claude Bernard Lyon Mise en œuvre de chitosane ou d'alginate en tant que masque de transfert dans des procedes de lithographie et de transfert

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3535137A (en) * 1967-01-13 1970-10-20 Ibm Method of fabricating etch resistant masks

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55106453A (en) * 1979-02-08 1980-08-15 Inst Opusuchiei I Neoruganichi Photograph material
JPS6333135B2 (ja) * 1979-02-08 1988-07-04 Insuchi* Obusuchei I Neoruganichesukoi Himii An Berorususukoi Ssr
JPS61256348A (ja) * 1985-05-10 1986-11-13 Nec Corp エネルギ−感応性樹脂
JPH0584514B2 (ja) * 1985-05-10 1993-12-02 Nippon Electric Co

Also Published As

Publication number Publication date
US3985915A (en) 1976-10-12
FR2295466A1 (fr) 1976-07-16
FR2295466B1 (ja) 1981-08-21
JPS5845693B2 (ja) 1983-10-12
GB1476289A (en) 1977-06-10
DE2553519A1 (de) 1976-07-01

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