JPS5166002A - - Google Patents

Info

Publication number
JPS5166002A
JPS5166002A JP50122394A JP12239475A JPS5166002A JP S5166002 A JPS5166002 A JP S5166002A JP 50122394 A JP50122394 A JP 50122394A JP 12239475 A JP12239475 A JP 12239475A JP S5166002 A JPS5166002 A JP S5166002A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50122394A
Other languages
Japanese (ja)
Inventor
Berunarudo Heotsu Ruisu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Production Printing Holding BV
Original Assignee
Oce Van der Grinten NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van der Grinten NV filed Critical Oce Van der Grinten NV
Publication of JPS5166002A publication Critical patent/JPS5166002A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP50122394A 1974-10-23 1975-10-09 Pending JPS5166002A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7413844A NL7413844A (en) 1974-10-23 1974-10-23 LITHOGRAPHIC COPY FILM.

Publications (1)

Publication Number Publication Date
JPS5166002A true JPS5166002A (en) 1976-06-08

Family

ID=19822318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50122394A Pending JPS5166002A (en) 1974-10-23 1975-10-09

Country Status (6)

Country Link
JP (1) JPS5166002A (en)
DE (1) DE2547335A1 (en)
FR (1) FR2288994A1 (en)
GB (1) GB1525757A (en)
NL (1) NL7413844A (en)
SE (1) SE7511027L (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837639A (en) * 1981-07-31 1983-03-04 Konishiroku Photo Ind Co Ltd Image forming material

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4472494A (en) * 1980-09-15 1984-09-18 Napp Systems (Usa), Inc. Bilayer photosensitive imaging article
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
US4729935A (en) * 1982-03-18 1988-03-08 Hoechst Celanese Corporation Process for the production of photographic images utilizing a negative working diazo contact film
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
EP0151191A1 (en) * 1984-01-25 1985-08-14 American Hoechst Corporation Photosensitive material for the production of orginals
US4564589A (en) * 1984-02-06 1986-01-14 Advanced Imaging Systems Ltd. Image-forming composite with film
US4618562A (en) * 1984-12-27 1986-10-21 American Hoechst Corporation Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837639A (en) * 1981-07-31 1983-03-04 Konishiroku Photo Ind Co Ltd Image forming material
JPH0231376B2 (en) * 1981-07-31 1990-07-12 Konishiroku Photo Ind

Also Published As

Publication number Publication date
DE2547335A1 (en) 1976-04-29
FR2288994A1 (en) 1976-05-21
SE7511027L (en) 1976-04-26
GB1525757A (en) 1978-09-20
NL7413844A (en) 1976-04-27

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