JPS516562B2 - - Google Patents

Info

Publication number
JPS516562B2
JPS516562B2 JP46101680A JP10168071A JPS516562B2 JP S516562 B2 JPS516562 B2 JP S516562B2 JP 46101680 A JP46101680 A JP 46101680A JP 10168071 A JP10168071 A JP 10168071A JP S516562 B2 JPS516562 B2 JP S516562B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP46101680A
Other languages
Japanese (ja)
Other versions
JPS4868302A (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46101680A priority Critical patent/JPS516562B2/ja
Priority to FR7244824A priority patent/FR2163703B1/fr
Priority to DE19722261494 priority patent/DE2261494C2/de
Priority to GB5819672A priority patent/GB1411966A/en
Publication of JPS4868302A publication Critical patent/JPS4868302A/ja
Priority to GB5190974A priority patent/GB1463900A/en
Publication of JPS516562B2 publication Critical patent/JPS516562B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyamides (AREA)
  • Graft Or Block Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP46101680A 1971-12-15 1971-12-15 Expired JPS516562B2 (enrdf_load_html_response)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP46101680A JPS516562B2 (enrdf_load_html_response) 1971-12-15 1971-12-15
FR7244824A FR2163703B1 (enrdf_load_html_response) 1971-12-15 1972-12-15
DE19722261494 DE2261494C2 (de) 1971-12-15 1972-12-15 Lichtempfindliche Polyamid-Zubereitung
GB5819672A GB1411966A (en) 1971-12-15 1972-12-15 Photosensitive polyamide compositions
GB5190974A GB1463900A (en) 1971-12-15 1974-11-29 Photosensitive polyamide composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46101680A JPS516562B2 (enrdf_load_html_response) 1971-12-15 1971-12-15

Publications (2)

Publication Number Publication Date
JPS4868302A JPS4868302A (enrdf_load_html_response) 1973-09-18
JPS516562B2 true JPS516562B2 (enrdf_load_html_response) 1976-02-28

Family

ID=14307047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46101680A Expired JPS516562B2 (enrdf_load_html_response) 1971-12-15 1971-12-15

Country Status (4)

Country Link
JP (1) JPS516562B2 (enrdf_load_html_response)
DE (1) DE2261494C2 (enrdf_load_html_response)
FR (1) FR2163703B1 (enrdf_load_html_response)
GB (2) GB1411966A (enrdf_load_html_response)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6030965U (ja) * 1983-08-05 1985-03-02 三菱重工業株式会社 冷凍装置

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127708A (enrdf_load_html_response) * 1973-04-16 1974-12-06
JPS5092996A (enrdf_load_html_response) * 1973-12-22 1975-07-24
JPS50105126A (enrdf_load_html_response) * 1974-01-26 1975-08-19
JPS50108003A (enrdf_load_html_response) * 1974-02-01 1975-08-26
JPS5149803A (ja) * 1974-10-28 1976-04-30 Unitika Ltd Kankoseijushisoseibutsuno nenchakuseiboshihoho
CA1149985A (en) * 1980-04-26 1983-07-12 Takashi Okamoto Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS5967258U (ja) * 1982-10-27 1984-05-07 東レ株式会社 スタンプ
GB2235927B (en) * 1989-09-14 1992-10-21 Asahi Chemical Ind A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
DE69413762T2 (de) * 1993-07-20 1999-03-04 Toray Industries, Inc., Tokio/Tokyo Fotoempfindliche Polymer-Zusammensetzung
KR100220662B1 (ko) * 1994-08-09 1999-09-15 야마모토 카즈모토 접착성 심지, 이의 제조 방법 및 접착성 심지용 접착제
US6010821A (en) 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
US6569602B1 (en) 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
US6890701B2 (en) * 2001-09-11 2005-05-10 Fuji Photo Film Co., Ltd. Photopolymerizable composition
EP1859000B1 (de) * 2005-02-10 2008-07-23 Bozzetto GmbH Vernetzbare schmelzklebermischung
DE102006017346B4 (de) * 2006-04-11 2011-01-27 Cpp Creative - Polymers - Produktions Gmbh Migrationsstabiler Masterbatch mit verbesserten Vernetzungseigenschaften, Verfahren zu dessen Herstellung und Verwendung desselben
JP2008273453A (ja) * 2007-05-02 2008-11-13 Hinomoto Osaka:Kk 鞄用車輪
US9828467B2 (en) 2016-02-05 2017-11-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6030965U (ja) * 1983-08-05 1985-03-02 三菱重工業株式会社 冷凍装置

Also Published As

Publication number Publication date
JPS4868302A (enrdf_load_html_response) 1973-09-18
GB1463900A (en) 1977-02-09
GB1411966A (en) 1975-10-29
DE2261494A1 (de) 1973-07-05
FR2163703B1 (enrdf_load_html_response) 1981-06-26
FR2163703A1 (enrdf_load_html_response) 1973-07-27
DE2261494C2 (de) 1982-03-04

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