JPS516562B2 - - Google Patents
Info
- Publication number
- JPS516562B2 JPS516562B2 JP46101680A JP10168071A JPS516562B2 JP S516562 B2 JPS516562 B2 JP S516562B2 JP 46101680 A JP46101680 A JP 46101680A JP 10168071 A JP10168071 A JP 10168071A JP S516562 B2 JPS516562 B2 JP S516562B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polyamides (AREA)
- Graft Or Block Polymers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46101680A JPS516562B2 (cg-RX-API-DMAC7.html) | 1971-12-15 | 1971-12-15 | |
| GB5819672A GB1411966A (en) | 1971-12-15 | 1972-12-15 | Photosensitive polyamide compositions |
| DE19722261494 DE2261494C2 (de) | 1971-12-15 | 1972-12-15 | Lichtempfindliche Polyamid-Zubereitung |
| FR7244824A FR2163703B1 (cg-RX-API-DMAC7.html) | 1971-12-15 | 1972-12-15 | |
| GB5190974A GB1463900A (en) | 1971-12-15 | 1974-11-29 | Photosensitive polyamide composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46101680A JPS516562B2 (cg-RX-API-DMAC7.html) | 1971-12-15 | 1971-12-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4868302A JPS4868302A (cg-RX-API-DMAC7.html) | 1973-09-18 |
| JPS516562B2 true JPS516562B2 (cg-RX-API-DMAC7.html) | 1976-02-28 |
Family
ID=14307047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46101680A Expired JPS516562B2 (cg-RX-API-DMAC7.html) | 1971-12-15 | 1971-12-15 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS516562B2 (cg-RX-API-DMAC7.html) |
| DE (1) | DE2261494C2 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2163703B1 (cg-RX-API-DMAC7.html) |
| GB (2) | GB1411966A (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6030965U (ja) * | 1983-08-05 | 1985-03-02 | 三菱重工業株式会社 | 冷凍装置 |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49127708A (cg-RX-API-DMAC7.html) * | 1973-04-16 | 1974-12-06 | ||
| JPS5092996A (cg-RX-API-DMAC7.html) * | 1973-12-22 | 1975-07-24 | ||
| JPS50105126A (cg-RX-API-DMAC7.html) * | 1974-01-26 | 1975-08-19 | ||
| JPS50108003A (cg-RX-API-DMAC7.html) * | 1974-02-01 | 1975-08-26 | ||
| JPS5149803A (ja) * | 1974-10-28 | 1976-04-30 | Unitika Ltd | Kankoseijushisoseibutsuno nenchakuseiboshihoho |
| CA1149985A (en) * | 1980-04-26 | 1983-07-12 | Takashi Okamoto | Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer |
| GB2092164B (en) * | 1980-12-17 | 1984-12-05 | Hitachi Ltd | Loght or radiation-sensitive polymer composition |
| JPS5967258U (ja) * | 1982-10-27 | 1984-05-07 | 東レ株式会社 | スタンプ |
| GB2235927B (en) * | 1989-09-14 | 1992-10-21 | Asahi Chemical Ind | A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same |
| DE69413762T2 (de) * | 1993-07-20 | 1999-03-04 | Toray Industries, Inc., Tokio/Tokyo | Fotoempfindliche Polymer-Zusammensetzung |
| EP0775773A4 (en) * | 1994-08-09 | 1998-08-26 | Asahi Chemical Ind | ADHESIVE UPHOLSTERY MATERIAL, METHOD FOR THE PRODUCTION THEREOF AND BINDING AGENT FOR UPHOLSTERY |
| US6010821A (en) | 1997-05-23 | 2000-01-04 | Minnesota Mining And Manufacturing Company | Aqueous developable color proofing elements |
| US6569602B1 (en) | 1998-10-05 | 2003-05-27 | E. I. Du Pont De Nemours And Company | Ionization radiation imageable photopolymer compositions |
| US6890701B2 (en) * | 2001-09-11 | 2005-05-10 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| DE502006001196D1 (de) * | 2005-02-10 | 2008-09-04 | Bozzetto Gmbh | Vernetzbare schmelzklebermischung |
| DE102006017346B4 (de) * | 2006-04-11 | 2011-01-27 | Cpp Creative - Polymers - Produktions Gmbh | Migrationsstabiler Masterbatch mit verbesserten Vernetzungseigenschaften, Verfahren zu dessen Herstellung und Verwendung desselben |
| JP2008273453A (ja) * | 2007-05-02 | 2008-11-13 | Hinomoto Osaka:Kk | 鞄用車輪 |
| US9828467B2 (en) | 2016-02-05 | 2017-11-28 | International Business Machines Corporation | Photoresponsive hexahydrotriazine polymers |
| US12617896B2 (en) | 2021-12-07 | 2026-05-05 | 3M Innovative Properties Company | Ionomer polyamides, primers, articles, and methods of making same |
-
1971
- 1971-12-15 JP JP46101680A patent/JPS516562B2/ja not_active Expired
-
1972
- 1972-12-15 GB GB5819672A patent/GB1411966A/en not_active Expired
- 1972-12-15 FR FR7244824A patent/FR2163703B1/fr not_active Expired
- 1972-12-15 DE DE19722261494 patent/DE2261494C2/de not_active Expired
-
1974
- 1974-11-29 GB GB5190974A patent/GB1463900A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6030965U (ja) * | 1983-08-05 | 1985-03-02 | 三菱重工業株式会社 | 冷凍装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1463900A (en) | 1977-02-09 |
| FR2163703B1 (cg-RX-API-DMAC7.html) | 1981-06-26 |
| FR2163703A1 (cg-RX-API-DMAC7.html) | 1973-07-27 |
| GB1411966A (en) | 1975-10-29 |
| DE2261494C2 (de) | 1982-03-04 |
| JPS4868302A (cg-RX-API-DMAC7.html) | 1973-09-18 |
| DE2261494A1 (de) | 1973-07-05 |