JPS5128467B1 - - Google Patents

Info

Publication number
JPS5128467B1
JPS5128467B1 JP46077948A JP7794871A JPS5128467B1 JP S5128467 B1 JPS5128467 B1 JP S5128467B1 JP 46077948 A JP46077948 A JP 46077948A JP 7794871 A JP7794871 A JP 7794871A JP S5128467 B1 JPS5128467 B1 JP S5128467B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP46077948A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5128467B1 publication Critical patent/JPS5128467B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00Investigating or analyzing materials by the use of thermal means
    • G01N25/20Investigating or analyzing materials by the use of thermal means by investigating the development of heat, i.e. calorimetry, e.g. by measuring specific heat, by measuring thermal conductivity
    • G01N25/48Investigating or analyzing materials by the use of thermal means by investigating the development of heat, i.e. calorimetry, e.g. by measuring specific heat, by measuring thermal conductivity on solution, sorption, or a chemical reaction not involving combustion or catalytic oxidation
    • G01N25/4806Details not adapted to a particular type of sample
    • G01N25/4813Details not adapted to a particular type of sample concerning the measuring means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/102Mask alignment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Biochemistry (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Combustion & Propulsion (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
  • Control Of Position Or Direction (AREA)
JP46077948A 1970-10-06 1971-10-06 Pending JPS5128467B1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7850570A 1970-10-06 1970-10-06

Publications (1)

Publication Number Publication Date
JPS5128467B1 true JPS5128467B1 (enExample) 1976-08-19

Family

ID=22144444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46077948A Pending JPS5128467B1 (enExample) 1970-10-06 1971-10-06

Country Status (7)

Country Link
US (1) US3710101A (enExample)
JP (1) JPS5128467B1 (enExample)
CA (1) CA930078A (enExample)
DE (1) DE2149344A1 (enExample)
FR (1) FR2111008A5 (enExample)
GB (1) GB1361804A (enExample)
IT (1) IT938979B (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2146106B1 (enExample) * 1971-07-16 1977-08-05 Thomson Csf
US3879613A (en) * 1971-12-13 1975-04-22 Philips Corp Methods of manufacturing semiconductor devices
US3832560A (en) * 1973-06-13 1974-08-27 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a member by detecting cathodoluminescence from oxide layers
US3895234A (en) * 1973-06-15 1975-07-15 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a member
US3840749A (en) * 1973-06-19 1974-10-08 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a semiconductor member
US3875414A (en) * 1973-08-20 1975-04-01 Secr Defence Brit Methods suitable for use in or in connection with the production of microelectronic devices
US3849659A (en) * 1973-09-10 1974-11-19 Westinghouse Electric Corp Alignment of a patterned electron beam with a member by electron backscatter
US4008402A (en) * 1974-07-18 1977-02-15 Westinghouse Electric Corporation Method and apparatus for electron beam alignment with a member by detecting X-rays
GB1520925A (en) * 1975-10-06 1978-08-09 Mullard Ltd Semiconductor device manufacture
US4039810A (en) * 1976-06-30 1977-08-02 International Business Machines Corporation Electron projection microfabrication system
GB1557064A (en) * 1976-09-09 1979-12-05 Mullard Ltd Masks suitable for use in electron image projectors
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
GB1604004A (en) * 1977-10-11 1981-12-02 Fujitsu Ltd Method and apparatus for processing semi-conductor wafers
JPS5827663B2 (ja) * 1979-06-04 1983-06-10 富士通株式会社 半導体装置の製造方法
JPS57183034A (en) * 1981-05-07 1982-11-11 Toshiba Corp Electron bean transfer device
JPS6088536U (ja) * 1983-11-24 1985-06-18 住友電気工業株式会社 化合物半導体ウエハ
JPS60201626A (ja) * 1984-03-27 1985-10-12 Canon Inc 位置合わせ装置
KR910000756B1 (en) * 1984-11-20 1991-02-06 Fujitsu Ltd Method for projection photoelectron image
US4871919A (en) * 1988-05-20 1989-10-03 International Business Machines Corporation Electron beam lithography alignment using electric field changes to achieve registration
US6875624B2 (en) * 2002-05-08 2005-04-05 Taiwan Semiconductor Manufacturing Co. Ltd. Combined E-beam and optical exposure semiconductor lithography
US7414403B2 (en) * 2003-07-31 2008-08-19 Chiodo Chris D Imaging machine / MRI positioning assembly for magnet coils and specimens at the sweet spot of an imaging field
CN108615250B (zh) * 2018-05-31 2022-04-26 上海联影医疗科技股份有限公司 图像重建方法、装置、系统和计算机可读存储介质

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3236707A (en) * 1963-05-24 1966-02-22 Sperry Rand Corp Electrical circuitry and method
US3326176A (en) * 1964-10-27 1967-06-20 Nat Res Corp Work-registration device including ionic beam probe
US3551734A (en) * 1968-12-18 1970-12-29 Westinghouse Electric Corp Multi-coil electron image control apparatus

Also Published As

Publication number Publication date
DE2149344A1 (de) 1972-04-13
CA930078A (en) 1973-07-10
IT938979B (it) 1973-02-10
US3710101A (en) 1973-01-09
FR2111008A5 (enExample) 1972-06-02
GB1361804A (en) 1974-07-30

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