|
US3853398A
(en)
*
|
1972-07-05 |
1974-12-10 |
Canon Kk |
Mask pattern printing device
|
|
US4011011A
(en)
*
|
1973-03-09 |
1977-03-08 |
The Perkin-Elmer Corporation |
Optical projection apparatus
|
|
DE2413551C2
(de)
*
|
1974-03-21 |
1985-03-21 |
Western Electric Co., Inc., New York, N.Y. |
Einrichtung zum Korrigieren der Lage einer lichtempfindlichen Fläche in einer Masken-Projektionsvorrichtung
|
|
US3865483A
(en)
*
|
1974-03-21 |
1975-02-11 |
Ibm |
Alignment illumination system
|
|
US3917399A
(en)
*
|
1974-10-02 |
1975-11-04 |
Tropel |
Catadioptric projection printer
|
|
DE3071052D1
(en)
*
|
1979-04-03 |
1985-10-10 |
Eaton Optimetrix Inc |
Improved step-and-repeat projection alignment and exposure system
|
|
US4473293A
(en)
*
|
1979-04-03 |
1984-09-25 |
Optimetrix Corporation |
Step-and-repeat projection alignment and exposure system
|
|
US4573791A
(en)
*
|
1979-04-03 |
1986-03-04 |
Optimetrix Corporation |
Step-and-repeat projection alignment and exposure system
|
|
US4414749A
(en)
|
1979-07-02 |
1983-11-15 |
Optimetrix Corporation |
Alignment and exposure system with an indicium of an axis of motion of the system
|
|
US4272187A
(en)
*
|
1979-12-17 |
1981-06-09 |
International Business Machines Corporation |
Automatic alignment of optical elements in an electrophotographic apparatus
|
|
US4597664A
(en)
*
|
1980-02-29 |
1986-07-01 |
Optimetrix Corporation |
Step-and-repeat projection alignment and exposure system with auxiliary optical unit
|
|
US4452526A
(en)
*
|
1980-02-29 |
1984-06-05 |
Optimetrix Corporation |
Step-and-repeat projection alignment and exposure system with auxiliary optical unit
|
|
JPS57192929A
(en)
*
|
1981-05-25 |
1982-11-27 |
Hitachi Ltd |
Projector provided with automatic focusing function
|
|
US4577958A
(en)
*
|
1982-06-18 |
1986-03-25 |
Eaton Optimetrix, Inc. |
Bore-sighted step-and-repeat projection alignment and exposure system
|
|
US4577957A
(en)
*
|
1983-01-07 |
1986-03-25 |
Eaton-Optimetrix, Inc. |
Bore-sighted step-and-repeat projection alignment and exposure system
|
|
FR2560397B1
(fr)
*
|
1984-02-28 |
1986-11-14 |
Commissariat Energie Atomique |
Appareil de microlithographie optique a systeme d'alignement local
|
|
US5052789A
(en)
*
|
1988-09-30 |
1991-10-01 |
Storz Instrument Company |
Multi-user microscope with orientation adjustment and method
|
|
USRE36740E
(en)
*
|
1990-03-30 |
2000-06-20 |
Nikon Corporation |
Cata-dioptric reduction projection optical system
|
|
US5220454A
(en)
*
|
1990-03-30 |
1993-06-15 |
Nikon Corporation |
Cata-dioptric reduction projection optical system
|
|
DE4203464B4
(de)
*
|
1991-02-08 |
2007-02-01 |
Carl Zeiss Smt Ag |
Katadioptrisches Reduktionsobjektiv
|
|
US5402267A
(en)
*
|
1991-02-08 |
1995-03-28 |
Carl-Zeiss-Stiftung |
Catadioptric reduction objective
|
|
JP3235077B2
(ja)
*
|
1991-09-28 |
2001-12-04 |
株式会社ニコン |
露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法
|
|
JP3085481B2
(ja)
*
|
1991-09-28 |
2000-09-11 |
株式会社ニコン |
反射屈折縮小投影光学系、及び該光学系を備えた露光装置
|
|
US5251070A
(en)
*
|
1991-09-28 |
1993-10-05 |
Nikon Corporation |
Catadioptric reduction projection optical system
|
|
US5212593A
(en)
*
|
1992-02-06 |
1993-05-18 |
Svg Lithography Systems, Inc. |
Broad band optical reduction system using matched multiple refractive element materials
|
|
JP2698521B2
(ja)
|
1992-12-14 |
1998-01-19 |
キヤノン株式会社 |
反射屈折型光学系及び該光学系を備える投影露光装置
|
|
JP2750062B2
(ja)
*
|
1992-12-14 |
1998-05-13 |
キヤノン株式会社 |
反射屈折型光学系及び該光学系を備える投影露光装置
|