JPS51148367A - Layer construction radiant ray resist - Google Patents
Layer construction radiant ray resistInfo
- Publication number
- JPS51148367A JPS51148367A JP50072580A JP7258075A JPS51148367A JP S51148367 A JPS51148367 A JP S51148367A JP 50072580 A JP50072580 A JP 50072580A JP 7258075 A JP7258075 A JP 7258075A JP S51148367 A JPS51148367 A JP S51148367A
- Authority
- JP
- Japan
- Prior art keywords
- layer construction
- radiant ray
- ray resist
- resist
- radiant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50072580A JPS51148367A (en) | 1975-06-14 | 1975-06-14 | Layer construction radiant ray resist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50072580A JPS51148367A (en) | 1975-06-14 | 1975-06-14 | Layer construction radiant ray resist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51148367A true JPS51148367A (en) | 1976-12-20 |
| JPS576253B2 JPS576253B2 (Direct) | 1982-02-04 |
Family
ID=13493449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50072580A Granted JPS51148367A (en) | 1975-06-14 | 1975-06-14 | Layer construction radiant ray resist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51148367A (Direct) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461931A (en) * | 1977-10-26 | 1979-05-18 | Seiko Epson Corp | Forming method of photo resist patterns |
| JPS5465480A (en) * | 1977-11-04 | 1979-05-26 | Tokyo Ouka Kougiyou Kk | Method of forming microminiature pattern |
| JPS5487525A (en) * | 1977-12-30 | 1979-07-12 | Ibm | Resist construction |
| JPS59222928A (ja) * | 1983-06-02 | 1984-12-14 | Matsushita Electronics Corp | マスク製作方法 |
| JPH0287146A (ja) * | 1988-09-26 | 1990-03-28 | Hitachi Ltd | 半導体装置の製造方法 |
| JP2008068876A (ja) * | 2006-09-12 | 2008-03-27 | Fuji Seal International Inc | ブリスター包装体 |
-
1975
- 1975-06-14 JP JP50072580A patent/JPS51148367A/ja active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461931A (en) * | 1977-10-26 | 1979-05-18 | Seiko Epson Corp | Forming method of photo resist patterns |
| JPS5465480A (en) * | 1977-11-04 | 1979-05-26 | Tokyo Ouka Kougiyou Kk | Method of forming microminiature pattern |
| JPS5487525A (en) * | 1977-12-30 | 1979-07-12 | Ibm | Resist construction |
| JPS59222928A (ja) * | 1983-06-02 | 1984-12-14 | Matsushita Electronics Corp | マスク製作方法 |
| JPH0287146A (ja) * | 1988-09-26 | 1990-03-28 | Hitachi Ltd | 半導体装置の製造方法 |
| JP2008068876A (ja) * | 2006-09-12 | 2008-03-27 | Fuji Seal International Inc | ブリスター包装体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS576253B2 (Direct) | 1982-02-04 |
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