JPS51145266A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS51145266A JPS51145266A JP6981175A JP6981175A JPS51145266A JP S51145266 A JPS51145266 A JP S51145266A JP 6981175 A JP6981175 A JP 6981175A JP 6981175 A JP6981175 A JP 6981175A JP S51145266 A JPS51145266 A JP S51145266A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- anode
- simplify
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To simplify the processing by means of anodic oxidation or of polishing anode instead of using semiconductor basic body as anode directly.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6981175A JPS51145266A (en) | 1975-06-09 | 1975-06-09 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6981175A JPS51145266A (en) | 1975-06-09 | 1975-06-09 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51145266A true JPS51145266A (en) | 1976-12-14 |
Family
ID=13413504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6981175A Pending JPS51145266A (en) | 1975-06-09 | 1975-06-09 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51145266A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63289819A (en) * | 1987-05-21 | 1988-11-28 | Nec Corp | Wet etching equipment |
JP2003045869A (en) * | 2001-08-01 | 2003-02-14 | Sony Corp | Anode formation system, method for forming porous layer using it and method for producing thin semiconductor film |
-
1975
- 1975-06-09 JP JP6981175A patent/JPS51145266A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63289819A (en) * | 1987-05-21 | 1988-11-28 | Nec Corp | Wet etching equipment |
JP2003045869A (en) * | 2001-08-01 | 2003-02-14 | Sony Corp | Anode formation system, method for forming porous layer using it and method for producing thin semiconductor film |
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