JPS51121254A - Method of removing impurities from silicon wafer - Google Patents

Method of removing impurities from silicon wafer

Info

Publication number
JPS51121254A
JPS51121254A JP3413076A JP3413076A JPS51121254A JP S51121254 A JPS51121254 A JP S51121254A JP 3413076 A JP3413076 A JP 3413076A JP 3413076 A JP3413076 A JP 3413076A JP S51121254 A JPS51121254 A JP S51121254A
Authority
JP
Japan
Prior art keywords
silicon wafer
removing impurities
impurities
wafer
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3413076A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5335436B2 (enExample
Inventor
Richiyaado Zuubaa Jiyon
Jiyon Gasuka Arekusanda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of JPS51121254A publication Critical patent/JPS51121254A/ja
Publication of JPS5335436B2 publication Critical patent/JPS5335436B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
JP3413076A 1975-03-28 1976-03-26 Method of removing impurities from silicon wafer Granted JPS51121254A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US56310475A 1975-03-28 1975-03-28

Publications (2)

Publication Number Publication Date
JPS51121254A true JPS51121254A (en) 1976-10-23
JPS5335436B2 JPS5335436B2 (enExample) 1978-09-27

Family

ID=24249133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3413076A Granted JPS51121254A (en) 1975-03-28 1976-03-26 Method of removing impurities from silicon wafer

Country Status (3)

Country Link
JP (1) JPS51121254A (enExample)
BE (1) BE840112A (enExample)
IT (1) IT1074452B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS546466A (en) * 1977-06-17 1979-01-18 Hitachi Ltd Surface cleaning method
JPS58146696U (ja) * 1982-03-25 1983-10-03 アロン化成株式会社 連続切断具
JPH0325936A (ja) * 1989-06-16 1991-02-04 American Teleph & Telegr Co <Att> 半導体ウェハの洗浄装置
JPH0521411A (ja) * 1991-07-12 1993-01-29 Fujitsu Ltd 表面処理方法及び表面処理装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997050019A1 (en) * 1996-06-25 1997-12-31 Cfm Technologies, Inc. Improved method for sulfuric acid resist stripping
JP4573282B2 (ja) * 2000-07-03 2010-11-04 株式会社Ｓｕｍｃｏ エピタキシャルシリコンウェーハの製造方法
JP7201422B2 (ja) 2018-12-21 2023-01-10 サカタインクス株式会社 活性エネルギー線硬化型フレキソ印刷インキ組成物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS546466A (en) * 1977-06-17 1979-01-18 Hitachi Ltd Surface cleaning method
JPS58146696U (ja) * 1982-03-25 1983-10-03 アロン化成株式会社 連続切断具
JPH0325936A (ja) * 1989-06-16 1991-02-04 American Teleph & Telegr Co <Att> 半導体ウェハの洗浄装置
JPH0521411A (ja) * 1991-07-12 1993-01-29 Fujitsu Ltd 表面処理方法及び表面処理装置

Also Published As

Publication number Publication date
JPS5335436B2 (enExample) 1978-09-27
BE840112A (fr) 1976-07-16
IT1074452B (it) 1985-04-20

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