JPS51110964A - - Google Patents
Info
- Publication number
- JPS51110964A JPS51110964A JP50035520A JP3552075A JPS51110964A JP S51110964 A JPS51110964 A JP S51110964A JP 50035520 A JP50035520 A JP 50035520A JP 3552075 A JP3552075 A JP 3552075A JP S51110964 A JPS51110964 A JP S51110964A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3552075A JPS5344786B2 (enrdf_load_stackoverflow) | 1975-03-26 | 1975-03-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3552075A JPS5344786B2 (enrdf_load_stackoverflow) | 1975-03-26 | 1975-03-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51110964A true JPS51110964A (enrdf_load_stackoverflow) | 1976-09-30 |
JPS5344786B2 JPS5344786B2 (enrdf_load_stackoverflow) | 1978-12-01 |
Family
ID=12444015
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3552075A Expired JPS5344786B2 (enrdf_load_stackoverflow) | 1975-03-26 | 1975-03-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5344786B2 (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55108735A (en) * | 1979-02-13 | 1980-08-21 | Fujitsu Ltd | Method for maintenance of electron beam exposure device |
JPS57199945U (enrdf_load_stackoverflow) * | 1981-06-15 | 1982-12-18 | ||
JPH0233844A (ja) * | 1988-07-22 | 1990-02-05 | Hitachi Ltd | 電子顕微鏡 |
JP2007305499A (ja) * | 2006-05-15 | 2007-11-22 | Hitachi High-Technologies Corp | 差動排気走査形電子顕微鏡 |
JP2009037966A (ja) * | 2007-08-03 | 2009-02-19 | Hitachi High-Technologies Corp | 走査電子顕微鏡 |
EP2329252A4 (en) * | 2008-09-28 | 2012-04-11 | Nano Ltd B | VACUUM DEVICE AND ELECTRONIC SCAN MICROSCOPE |
US9431213B2 (en) | 2008-07-03 | 2016-08-30 | B-Nano Ltd. | Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment |
US9466458B2 (en) | 2013-02-20 | 2016-10-11 | B-Nano Ltd. | Scanning electron microscope |
-
1975
- 1975-03-26 JP JP3552075A patent/JPS5344786B2/ja not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55108735A (en) * | 1979-02-13 | 1980-08-21 | Fujitsu Ltd | Method for maintenance of electron beam exposure device |
JPS57199945U (enrdf_load_stackoverflow) * | 1981-06-15 | 1982-12-18 | ||
JPH0233844A (ja) * | 1988-07-22 | 1990-02-05 | Hitachi Ltd | 電子顕微鏡 |
JP2007305499A (ja) * | 2006-05-15 | 2007-11-22 | Hitachi High-Technologies Corp | 差動排気走査形電子顕微鏡 |
JP2009037966A (ja) * | 2007-08-03 | 2009-02-19 | Hitachi High-Technologies Corp | 走査電子顕微鏡 |
US9431213B2 (en) | 2008-07-03 | 2016-08-30 | B-Nano Ltd. | Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment |
EP2329252A4 (en) * | 2008-09-28 | 2012-04-11 | Nano Ltd B | VACUUM DEVICE AND ELECTRONIC SCAN MICROSCOPE |
US9466458B2 (en) | 2013-02-20 | 2016-10-11 | B-Nano Ltd. | Scanning electron microscope |
Also Published As
Publication number | Publication date |
---|---|
JPS5344786B2 (enrdf_load_stackoverflow) | 1978-12-01 |