JPS51105932A - - Google Patents

Info

Publication number
JPS51105932A
JPS51105932A JP50030147A JP3014775A JPS51105932A JP S51105932 A JPS51105932 A JP S51105932A JP 50030147 A JP50030147 A JP 50030147A JP 3014775 A JP3014775 A JP 3014775A JP S51105932 A JPS51105932 A JP S51105932A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50030147A
Other versions
JPS5627594B2 (ja
Inventor
Kanji Murakami
Mineo Kawamoto
Mototsugu Wajima
Yasusada Morishita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3014775A priority Critical patent/JPS5627594B2/ja
Priority to US05/665,708 priority patent/US4099974A/en
Priority to DE2610470A priority patent/DE2610470C3/de
Publication of JPS51105932A publication Critical patent/JPS51105932A/ja
Publication of JPS5627594B2 publication Critical patent/JPS5627594B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents
    • C23C18/405—Formaldehyde

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP3014775A 1975-03-14 1975-03-14 Expired JPS5627594B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3014775A JPS5627594B2 (ja) 1975-03-14 1975-03-14
US05/665,708 US4099974A (en) 1975-03-14 1976-03-10 Electroless copper solution
DE2610470A DE2610470C3 (de) 1975-03-14 1976-03-12 Verfahren zur stromlosen Abscheidung von Kupferschichten

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3014775A JPS5627594B2 (ja) 1975-03-14 1975-03-14

Publications (2)

Publication Number Publication Date
JPS51105932A true JPS51105932A (ja) 1976-09-20
JPS5627594B2 JPS5627594B2 (ja) 1981-06-25

Family

ID=12295640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3014775A Expired JPS5627594B2 (ja) 1975-03-14 1975-03-14

Country Status (3)

Country Link
US (1) US4099974A (ja)
JP (1) JPS5627594B2 (ja)
DE (1) DE2610470C3 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56156749A (en) * 1980-05-08 1981-12-03 Toshiba Corp Chemical copper plating solution
JPS5716158A (en) * 1980-06-30 1982-01-27 Matsushita Electric Ind Co Ltd Copper electroless plating liquid
JPS5923862A (ja) * 1982-07-29 1984-02-07 Nec Corp 無電解銅めつき液およびその製造方法
JPS59172702U (ja) * 1983-05-02 1984-11-19 三浦　芳明 スナツプ・ワイシヤツ
US5131377A (en) * 1990-06-22 1992-07-21 Mitsubishi Denki Kabushiki Kaisha Ignition device for an internal combustion engine provided with an optoisolator
EP1196016A3 (en) * 2000-10-03 2004-06-30 Hitachi, Ltd. Wiring substrate and manufacturing method of the same along with electroless copper plating solution used therefor
JP2011231382A (ja) * 2010-04-28 2011-11-17 Nagoya Plating Co Ltd 高分子繊維のめっき液並びにこれを用いた高分子繊維のめっき方法及びその製造方法

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4303443A (en) * 1979-06-15 1981-12-01 Hitachi, Ltd. Electroless copper plating solution
AU547410B2 (en) * 1980-08-12 1985-10-17 Macdermid, Inc. Method for continuous metal deposition from a non- autocatalytic electroless plating bath using electric potential
US4459184A (en) * 1980-08-12 1984-07-10 Macdermid, Inc. Method for continuous metal deposition from a non-autocatalytic electroless plating bath using electric potential
JPS605079B2 (ja) * 1980-09-02 1985-02-08 株式会社日立製作所 プリント基板の製造方法
JPS5830760B2 (ja) * 1980-10-09 1983-07-01 株式会社日立製作所 プリント回路板の製法
US4548644A (en) * 1982-09-28 1985-10-22 Hitachi Chemical Company, Ltd. Electroless copper deposition solution
JPS6033358A (ja) * 1983-08-04 1985-02-20 Hitachi Chem Co Ltd 無電解銅めっき液
US4908242A (en) * 1986-10-31 1990-03-13 Kollmorgen Corporation Method of consistently producing a copper deposit on a substrate by electroless deposition which deposit is essentially free of fissures
ES2039403T3 (es) * 1986-10-31 1993-10-01 Amp-Akzo Corporation (A Delaware Corp.) Metodo para depositar sin electricidad cobre de alta calidad.
US4818286A (en) * 1988-03-08 1989-04-04 International Business Machines Corporation Electroless copper plating bath
US5158604A (en) * 1991-07-01 1992-10-27 Monsanto Company Viscous electroless plating solutions
US5306336A (en) * 1992-11-20 1994-04-26 Monsanto Company Sulfate-free electroless copper plating baths
DE4440299A1 (de) * 1994-11-11 1996-05-15 Metallgesellschaft Ag Verfahren zur stromlosen Abscheidung von Kupferüberzügen auf Eisen- und Eisenlegierungsoberflächen
TWI348499B (en) * 2006-07-07 2011-09-11 Rohm & Haas Elect Mat Electroless copper and redox couples
TWI347373B (en) * 2006-07-07 2011-08-21 Rohm & Haas Elect Mat Formaldehyde free electroless copper compositions
TWI347982B (en) * 2006-07-07 2011-09-01 Rohm & Haas Elect Mat Improved electroless copper compositions
EP1876262A1 (en) * 2006-07-07 2008-01-09 Rohm and Haas Electronic Materials, L.L.C. Environmentally friendly electroless copper compositions
KR20080083790A (ko) * 2007-03-13 2008-09-19 삼성전자주식회사 무전해 구리 도금액, 그의 제조방법 및 무전해 구리도금방법
KR101036091B1 (ko) * 2008-11-24 2011-05-19 삼성에스디아이 주식회사 이차 전지용 회로기판 및 이를 구비하는 이차 전지
CN108777915B (zh) * 2017-05-30 2021-07-23 杨军 在多孔基底上制造高导电特性铜-纤维混合物的方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3377174A (en) * 1963-10-24 1968-04-09 Torigai Eiichi Method and bath for chemically plating copper
US3472664A (en) * 1966-09-15 1969-10-14 Enthone Inhibiting stardusting in electroless copper plating
DE1806081B2 (de) * 1967-10-27 1971-08-12 Alkalisches bad zur stromlosen kupferabscheidung
US3615736A (en) * 1969-01-06 1971-10-26 Enthone Electroless copper plating bath
US3607317A (en) * 1969-02-04 1971-09-21 Photocircuits Corp Ductility promoter and stabilizer for electroless copper plating baths
BE757573A (fr) * 1969-10-16 1971-04-15 Philips Nv Depot sans courant de cuivre flexible

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56156749A (en) * 1980-05-08 1981-12-03 Toshiba Corp Chemical copper plating solution
JPS5716158A (en) * 1980-06-30 1982-01-27 Matsushita Electric Ind Co Ltd Copper electroless plating liquid
JPS6312139B2 (ja) * 1980-06-30 1988-03-17 Matsushita Electric Ind Co Ltd
JPS5923862A (ja) * 1982-07-29 1984-02-07 Nec Corp 無電解銅めつき液およびその製造方法
JPS59172702U (ja) * 1983-05-02 1984-11-19 三浦　芳明 スナツプ・ワイシヤツ
US5131377A (en) * 1990-06-22 1992-07-21 Mitsubishi Denki Kabushiki Kaisha Ignition device for an internal combustion engine provided with an optoisolator
EP1196016A3 (en) * 2000-10-03 2004-06-30 Hitachi, Ltd. Wiring substrate and manufacturing method of the same along with electroless copper plating solution used therefor
JP2011231382A (ja) * 2010-04-28 2011-11-17 Nagoya Plating Co Ltd 高分子繊維のめっき液並びにこれを用いた高分子繊維のめっき方法及びその製造方法

Also Published As

Publication number Publication date
DE2610470B2 (de) 1978-02-16
DE2610470C3 (de) 1983-02-24
DE2610470A1 (de) 1976-09-30
JPS5627594B2 (ja) 1981-06-25
US4099974A (en) 1978-07-11

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