JPS5078401A - - Google Patents

Info

Publication number
JPS5078401A
JPS5078401A JP13039073A JP13039073A JPS5078401A JP S5078401 A JPS5078401 A JP S5078401A JP 13039073 A JP13039073 A JP 13039073A JP 13039073 A JP13039073 A JP 13039073A JP S5078401 A JPS5078401 A JP S5078401A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13039073A
Other languages
Japanese (ja)
Other versions
JPS5236042B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13039073A priority Critical patent/JPS5236042B2/ja
Priority to DE19742454676 priority patent/DE2454676C3/de
Priority to FR7439296A priority patent/FR2251838A1/fr
Publication of JPS5078401A publication Critical patent/JPS5078401A/ja
Publication of JPS5236042B2 publication Critical patent/JPS5236042B2/ja
Priority to US05/843,850 priority patent/US4187112A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Graft Or Block Polymers (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
JP13039073A 1973-11-19 1973-11-19 Expired JPS5236042B2 (enrdf_load_stackoverflow)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP13039073A JPS5236042B2 (enrdf_load_stackoverflow) 1973-11-19 1973-11-19
DE19742454676 DE2454676C3 (de) 1973-11-19 1974-11-19 Lichtempfindliches Gemisch
FR7439296A FR2251838A1 (en) 1973-11-19 1974-11-29 Light-sensitive compsn. contg. polymer with ammonium gps. - in main or side chain for printing plate mfr. etc.
US05/843,850 US4187112A (en) 1973-11-19 1977-10-20 Photosensitive plate containing nitrogen containing condensation type polyesters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13039073A JPS5236042B2 (enrdf_load_stackoverflow) 1973-11-19 1973-11-19

Publications (2)

Publication Number Publication Date
JPS5078401A true JPS5078401A (enrdf_load_stackoverflow) 1975-06-26
JPS5236042B2 JPS5236042B2 (enrdf_load_stackoverflow) 1977-09-13

Family

ID=15033163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13039073A Expired JPS5236042B2 (enrdf_load_stackoverflow) 1973-11-19 1973-11-19

Country Status (3)

Country Link
JP (1) JPS5236042B2 (enrdf_load_stackoverflow)
DE (1) DE2454676C3 (enrdf_load_stackoverflow)
FR (1) FR2251838A1 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5177171A (en) * 1989-09-14 1993-01-05 Asahi Kasei Kogyo Kabushiki Kaisha Sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
WO1993003423A1 (en) * 1991-08-09 1993-02-18 Toyo Ink Manufacturing Co., Ltd. Photosensitive resin composition, production thereof, and flexographic plate material

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2104232B (en) * 1981-07-27 1985-02-27 Toyo Bosenki Kk Photosensitive resin composition
DE3131448A1 (de) * 1981-08-07 1983-02-24 Basf Ag, 6700 Ludwigshafen Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse
DE19501726A1 (de) * 1995-01-20 1996-07-25 Merck Patent Gmbh Polymerisationsfähige Derivate von Polyamiden

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2274831A (en) * 1939-07-20 1942-03-03 Du Pont Polyamides and process for their preparation
US2887376A (en) * 1956-01-26 1959-05-19 Eastman Kodak Co Photographic reproduction process using light-sensitive polymers
NL219906A (enrdf_load_stackoverflow) * 1956-08-14
DE1447017B2 (de) * 1963-10-26 1971-08-12 Kalle AG, 6202 Wiesbaden Biebrich Verfahren zur herstellung von druckformen gedruckten schal tungen oder metallaetzungen
DE1772722A1 (de) * 1968-06-26 1971-06-03 Basf Ag Verfahren zur Herstellung von Reliefformen fuer Druckzwecke
SU363066A1 (ru) * 1971-04-20 1972-12-30 Авторы изобретени витель Всеооюз

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5177171A (en) * 1989-09-14 1993-01-05 Asahi Kasei Kogyo Kabushiki Kaisha Sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
WO1993003423A1 (en) * 1991-08-09 1993-02-18 Toyo Ink Manufacturing Co., Ltd. Photosensitive resin composition, production thereof, and flexographic plate material

Also Published As

Publication number Publication date
DE2454676B2 (de) 1980-01-31
FR2251838A1 (en) 1975-06-13
JPS5236042B2 (enrdf_load_stackoverflow) 1977-09-13
FR2251838B1 (enrdf_load_stackoverflow) 1981-12-31
DE2454676C3 (de) 1985-08-29
DE2454676A1 (de) 1975-05-22

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