JPS5071273A - - Google Patents

Info

Publication number
JPS5071273A
JPS5071273A JP49075488A JP7548874A JPS5071273A JP S5071273 A JPS5071273 A JP S5071273A JP 49075488 A JP49075488 A JP 49075488A JP 7548874 A JP7548874 A JP 7548874A JP S5071273 A JPS5071273 A JP S5071273A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49075488A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5071273A publication Critical patent/JPS5071273A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
  • Weting (AREA)
JP49075488A 1973-07-06 1974-07-03 Pending JPS5071273A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7309451A NL7309451A (nl) 1973-07-06 1973-07-06 Werkwijze voor het vervaardigen van een inrichting.

Publications (1)

Publication Number Publication Date
JPS5071273A true JPS5071273A (fr) 1975-06-13

Family

ID=19819217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49075488A Pending JPS5071273A (fr) 1973-07-06 1974-07-03

Country Status (7)

Country Link
JP (1) JPS5071273A (fr)
CA (1) CA1032397A (fr)
DE (1) DE2431311C3 (fr)
FR (1) FR2236336B1 (fr)
GB (1) GB1453253A (fr)
IT (1) IT1037067B (fr)
NL (1) NL7309451A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165395A (en) * 1977-06-30 1979-08-21 International Business Machines Corporation Process for forming a high aspect ratio structure by successive exposures with electron beam and actinic radiation
GB8825826D0 (en) * 1988-11-04 1988-12-07 Gen Electric Co Plc Deposition processes
US4985116A (en) * 1990-02-23 1991-01-15 Mint-Pac Technologies, Inc. Three dimensional plating or etching process and masks therefor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3518084A (en) * 1967-01-09 1970-06-30 Ibm Method for etching an opening in an insulating layer without forming pinholes therein

Also Published As

Publication number Publication date
DE2431311B2 (de) 1980-08-21
GB1453253A (en) 1976-10-20
NL7309451A (nl) 1975-01-08
FR2236336B1 (fr) 1977-10-07
CA1032397A (fr) 1978-06-06
DE2431311A1 (de) 1975-01-30
FR2236336A1 (fr) 1975-01-31
IT1037067B (it) 1979-11-10
DE2431311C3 (de) 1981-07-02

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