IT1037067B - Metodo per fabricare un dispositivo ad esempio un dispositivo semiconduttore o una testina magnetica mediante una fotomaschera - Google Patents
Metodo per fabricare un dispositivo ad esempio un dispositivo semiconduttore o una testina magnetica mediante una fotomascheraInfo
- Publication number
- IT1037067B IT1037067B IT2476774A IT2476774A IT1037067B IT 1037067 B IT1037067 B IT 1037067B IT 2476774 A IT2476774 A IT 2476774A IT 2476774 A IT2476774 A IT 2476774A IT 1037067 B IT1037067 B IT 1037067B
- Authority
- IT
- Italy
- Prior art keywords
- photomask
- making
- magnetic head
- semiconducting
- semiconducting device
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7309451A NL7309451A (nl) | 1973-07-06 | 1973-07-06 | Werkwijze voor het vervaardigen van een inrichting. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT1037067B true IT1037067B (it) | 1979-11-10 |
Family
ID=19819217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT2476774A IT1037067B (it) | 1973-07-06 | 1974-07-03 | Metodo per fabricare un dispositivo ad esempio un dispositivo semiconduttore o una testina magnetica mediante una fotomaschera |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5071273A (it) |
| CA (1) | CA1032397A (it) |
| DE (1) | DE2431311C3 (it) |
| FR (1) | FR2236336B1 (it) |
| GB (1) | GB1453253A (it) |
| IT (1) | IT1037067B (it) |
| NL (1) | NL7309451A (it) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4165395A (en) * | 1977-06-30 | 1979-08-21 | International Business Machines Corporation | Process for forming a high aspect ratio structure by successive exposures with electron beam and actinic radiation |
| GB8825826D0 (en) * | 1988-11-04 | 1988-12-07 | Gen Electric Co Plc | Deposition processes |
| US4985116A (en) * | 1990-02-23 | 1991-01-15 | Mint-Pac Technologies, Inc. | Three dimensional plating or etching process and masks therefor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3518084A (en) * | 1967-01-09 | 1970-06-30 | Ibm | Method for etching an opening in an insulating layer without forming pinholes therein |
-
1973
- 1973-07-06 NL NL7309451A patent/NL7309451A/xx unknown
-
1974
- 1974-06-29 DE DE19742431311 patent/DE2431311C3/de not_active Expired
- 1974-07-03 IT IT2476774A patent/IT1037067B/it active
- 1974-07-03 JP JP49075488A patent/JPS5071273A/ja active Pending
- 1974-07-03 GB GB2948174A patent/GB1453253A/en not_active Expired
- 1974-07-08 FR FR7423638A patent/FR2236336B1/fr not_active Expired
- 1974-07-30 CA CA205,919A patent/CA1032397A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL7309451A (nl) | 1975-01-08 |
| DE2431311C3 (de) | 1981-07-02 |
| GB1453253A (en) | 1976-10-20 |
| FR2236336A1 (it) | 1975-01-31 |
| DE2431311A1 (de) | 1975-01-30 |
| CA1032397A (en) | 1978-06-06 |
| JPS5071273A (it) | 1975-06-13 |
| DE2431311B2 (de) | 1980-08-21 |
| FR2236336B1 (it) | 1977-10-07 |
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