JPS5060303A - - Google Patents

Info

Publication number
JPS5060303A
JPS5060303A JP49095491A JP9549174A JPS5060303A JP S5060303 A JPS5060303 A JP S5060303A JP 49095491 A JP49095491 A JP 49095491A JP 9549174 A JP9549174 A JP 9549174A JP S5060303 A JPS5060303 A JP S5060303A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49095491A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5060303A publication Critical patent/JPS5060303A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP49095491A 1973-10-03 1974-08-20 Pending JPS5060303A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/403,222 US3944421A (en) 1973-10-03 1973-10-03 Process for simultaneous development and etch of photoresist and substrate

Publications (1)

Publication Number Publication Date
JPS5060303A true JPS5060303A (ja) 1975-05-24

Family

ID=23594960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49095491A Pending JPS5060303A (ja) 1973-10-03 1974-08-20

Country Status (3)

Country Link
US (1) US3944421A (ja)
JP (1) JPS5060303A (ja)
DE (1) DE2446848A1 (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5810753B2 (ja) * 1975-09-29 1983-02-26 シャープ株式会社 エレクトロクロミツクヒヨウジソシノ セイゾウホウホウ
JPS5299101A (en) * 1976-02-16 1977-08-19 Fuji Photo Film Co Ltd Liquid of treating metalic image forming material
JPS55120032A (en) * 1979-03-09 1980-09-16 Daicel Chem Ind Ltd Treating solution for photosensitive laminate having alcohol-soluble polyamide layer
DE3134054A1 (de) * 1981-08-28 1983-05-05 Hoechst Ag, 6230 Frankfurt Elektrochemisches entwicklungsverfahren fuer reproduktionsschichten
DE3246403A1 (de) * 1982-12-15 1984-06-20 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur entwicklung von reliefstrukturen auf der basis von strahlungsvernetzten polymervorstufen hochwaermebestaendiger polymere
US4942108A (en) * 1985-12-05 1990-07-17 International Business Machines Corporation Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
EP0224680B1 (en) * 1985-12-05 1992-01-15 International Business Machines Corporation Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
JPH0294807A (ja) * 1988-09-30 1990-04-05 Mitsubishi Mining & Cement Co Ltd 弾性表面波装置の製法
US5858940A (en) * 1996-04-30 1999-01-12 Orcutt; James L. Printing plate image deletion composition
DE10005850B4 (de) * 2000-02-10 2004-06-09 Forschungszentrum Karlsruhe Gmbh Verfahren zur Herstellung von Mikrostrukturen
US8216384B2 (en) * 2009-01-15 2012-07-10 Intermolecular, Inc. Combinatorial approach to the development of cleaning formulations for wet removal of high dose implant photoresist
US8664014B2 (en) 2011-11-17 2014-03-04 Intermolecular, Inc. High productivity combinatorial workflow for photoresist strip applications
US20130160832A1 (en) * 2011-12-22 2013-06-27 Andreas Krause Marking of a substrate of a solar cell
EP3914943A4 (en) * 2019-01-24 2022-10-26 Palone, Thomas SYSTEM, DEVICE AND METHOD FOR ALIGNMENT AND ATTACHMENT OF OPTICAL FIBERS

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3019106A (en) * 1959-06-30 1962-01-30 Algraphy Ltd Processing of pre-sensitised lithographic printing plates
NL131134C (ja) * 1964-07-29
US3639185A (en) * 1969-06-30 1972-02-01 Ibm Novel etchant and process for etching thin metal films
US3698904A (en) * 1969-07-23 1972-10-17 Asahi Chemical Ind Composition for developing photopolymerizable lithographic plate elements comprising a developer base agent,an ink-receptivity-affording agent and a desensitizer

Also Published As

Publication number Publication date
US3944421A (en) 1976-03-16
DE2446848A1 (de) 1975-04-10

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