JPS5039876A - - Google Patents
Info
- Publication number
- JPS5039876A JPS5039876A JP8964773A JP8964773A JPS5039876A JP S5039876 A JPS5039876 A JP S5039876A JP 8964773 A JP8964773 A JP 8964773A JP 8964773 A JP8964773 A JP 8964773A JP S5039876 A JPS5039876 A JP S5039876A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8964773A JPS5740650B2 (cs) | 1973-08-11 | 1973-08-11 | |
| US05/495,678 US3984301A (en) | 1973-08-11 | 1974-08-08 | Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8964773A JPS5740650B2 (cs) | 1973-08-11 | 1973-08-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5039876A true JPS5039876A (cs) | 1975-04-12 |
| JPS5740650B2 JPS5740650B2 (cs) | 1982-08-28 |
Family
ID=13976546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8964773A Expired JPS5740650B2 (cs) | 1973-08-11 | 1973-08-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5740650B2 (cs) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52114444A (en) * | 1976-03-22 | 1977-09-26 | Nippon Telegraph & Telephone | Plasma etching method |
| JPS52116785A (en) * | 1976-03-03 | 1977-09-30 | Int Plasma Corp | Method and apparatus for gas plasma reaction |
| JPS52123938A (en) * | 1976-04-13 | 1977-10-18 | Fujitsu Ltd | Spatter etching method |
| JPS55175095U (cs) * | 1979-05-29 | 1980-12-15 | ||
| JPS5635775A (en) * | 1980-08-06 | 1981-04-08 | Fujitsu Ltd | Ion beam etching method |
| JPS60143633A (ja) * | 1984-11-29 | 1985-07-29 | Hitachi Ltd | 半導体装置の製造方法 |
| EP1061257A1 (en) | 1999-06-15 | 2000-12-20 | Fujikoki Corporation | Regulating valve for variable displacement swash plate compressor and its assembly method |
| JP2009061407A (ja) * | 2007-09-07 | 2009-03-26 | Toto Sekisui Kk | 沈降装置、沈殿処理システム及び沈降装置の製造方法 |
| JP2010264409A (ja) * | 2009-05-18 | 2010-11-25 | Isomura Hosui Kiko Co Ltd | 傾斜管ユニット及びその製造方法 |
-
1973
- 1973-08-11 JP JP8964773A patent/JPS5740650B2/ja not_active Expired
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52116785A (en) * | 1976-03-03 | 1977-09-30 | Int Plasma Corp | Method and apparatus for gas plasma reaction |
| JPS52114444A (en) * | 1976-03-22 | 1977-09-26 | Nippon Telegraph & Telephone | Plasma etching method |
| JPS52123938A (en) * | 1976-04-13 | 1977-10-18 | Fujitsu Ltd | Spatter etching method |
| JPS55175095U (cs) * | 1979-05-29 | 1980-12-15 | ||
| JPS5635775A (en) * | 1980-08-06 | 1981-04-08 | Fujitsu Ltd | Ion beam etching method |
| JPS60143633A (ja) * | 1984-11-29 | 1985-07-29 | Hitachi Ltd | 半導体装置の製造方法 |
| EP1061257A1 (en) | 1999-06-15 | 2000-12-20 | Fujikoki Corporation | Regulating valve for variable displacement swash plate compressor and its assembly method |
| JP2009061407A (ja) * | 2007-09-07 | 2009-03-26 | Toto Sekisui Kk | 沈降装置、沈殿処理システム及び沈降装置の製造方法 |
| JP2010264409A (ja) * | 2009-05-18 | 2010-11-25 | Isomura Hosui Kiko Co Ltd | 傾斜管ユニット及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5740650B2 (cs) | 1982-08-28 |