JPS5023782A - - Google Patents
Info
- Publication number
- JPS5023782A JPS5023782A JP49056794A JP5679474A JPS5023782A JP S5023782 A JPS5023782 A JP S5023782A JP 49056794 A JP49056794 A JP 49056794A JP 5679474 A JP5679474 A JP 5679474A JP S5023782 A JPS5023782 A JP S5023782A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Radar Systems Or Details Thereof (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US368384A US3924113A (en) | 1973-06-08 | 1973-06-08 | Electron beam registration system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5023782A true JPS5023782A (US06235095-20010522-C00021.png) | 1975-03-14 |
| JPS5248060B2 JPS5248060B2 (US06235095-20010522-C00021.png) | 1977-12-07 |
Family
ID=23450995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49056794A Expired JPS5248060B2 (US06235095-20010522-C00021.png) | 1973-06-08 | 1974-05-22 |
Country Status (7)
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5219934A (en) * | 1975-08-04 | 1977-02-15 | Telecommunications Sa | Electromechanical band filter |
| JPS5315076A (en) * | 1976-07-28 | 1978-02-10 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam position detection method |
| JPS5319764A (en) * | 1976-08-09 | 1978-02-23 | Nippon Telegr & Teleph Corp <Ntt> | Mark detection system in electron beam exposure |
| JPS5392670A (en) * | 1977-01-20 | 1978-08-14 | Siemens Ag | Method of positioning workpiece having mark |
| JPS57106130A (en) * | 1980-12-24 | 1982-07-01 | Jeol Ltd | Detecting method for mark |
| JPS57122517A (en) * | 1981-01-22 | 1982-07-30 | Nippon Telegr & Teleph Corp <Ntt> | Alignment mark detector for electron beam exposure |
| JPS58122725A (ja) * | 1982-01-14 | 1983-07-21 | Nippon Telegr & Teleph Corp <Ntt> | ビ−ム形状測定装置 |
| JPS6445122A (en) * | 1987-08-13 | 1989-02-17 | Jeol Ltd | Beam size measuring apparatus |
| JP2018538659A (ja) * | 2015-10-16 | 2018-12-27 | エイ・エル・ディー ヴァキューム テクノロジーズ ゲー・エム・ベー・ハーＡＬＤ Ｖａｃｕｕｍ Ｔｅｃｈｎｏｌｏｇｉｅｓ ＧｍｂＨ | 区切られた面上におけるエネルギービームの入射点の可変の位置を特定するための方法 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2846316A1 (de) * | 1978-10-24 | 1980-06-04 | Siemens Ag | Verfahren und vorrichtung zur automatischen ausrichtung von zwei aufeinander einzujustierenden objekten |
| JPS6058793B2 (ja) * | 1980-03-24 | 1985-12-21 | 日電アネルバ株式会社 | プラズマ分光監視装置 |
| US4387433A (en) * | 1980-12-24 | 1983-06-07 | International Business Machines Corporation | High speed data interface buffer for digitally controlled electron beam exposure system |
| US4546260A (en) * | 1983-06-30 | 1985-10-08 | International Business Machines Corporation | Alignment technique |
| FR2586506B1 (fr) * | 1985-08-20 | 1988-01-29 | Primat Didier | Procede et dispositif optique et electronique pour assurer la decoupe automatique de plaques |
| US4803644A (en) * | 1985-09-20 | 1989-02-07 | Hughes Aircraft Company | Alignment mark detector for electron beam lithography |
| DE3735154C2 (de) * | 1986-10-17 | 1994-10-20 | Canon Kk | Verfahren zum Erfassen der Lage einer auf einem Objekt vorgesehenen Marke |
| US10991545B2 (en) | 2008-06-30 | 2021-04-27 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
| US10566169B1 (en) | 2008-06-30 | 2020-02-18 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3328795A (en) * | 1959-11-18 | 1967-06-27 | Ling Temco Vought Inc | Fixtaking means and method |
| US3329813A (en) * | 1964-08-25 | 1967-07-04 | Jeol Ltd | Backscatter electron analysis apparatus to determine elemental content or surface topography of a specimen |
| US3535516A (en) * | 1966-10-17 | 1970-10-20 | Hitachi Ltd | Electron microscope employing a modulated scanning beam and a phase sensitive detector to improve the signal to noise ratio |
| US3614736A (en) * | 1968-05-21 | 1971-10-19 | Ibm | Pattern recognition apparatus and methods invariant to translation, scale change and rotation |
| US3646333A (en) * | 1969-12-12 | 1972-02-29 | Us Navy | Digital correlator and integrator |
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| US3745317A (en) * | 1970-05-04 | 1973-07-10 | Commissariat Energie Atomique | System for generating the fourier transform of a function |
| US3644899A (en) * | 1970-07-29 | 1972-02-22 | Cogar Corp | Method for determining partial memory chip categories |
| US3717756A (en) * | 1970-10-30 | 1973-02-20 | Electronic Communications | High precision circulating digital correlator |
| US3777133A (en) * | 1971-01-26 | 1973-12-04 | C Wormald | Cross correlator |
| CA953010A (en) * | 1971-12-03 | 1974-08-13 | Her Majesty In Right Of Canada As Represented By The Minister Of Transpo Rt | Radar cross correlator |
| US3718813A (en) * | 1972-01-19 | 1973-02-27 | O Williams | Technique for correlation method of determining system impulse response |
-
1973
- 1973-06-08 US US368384A patent/US3924113A/en not_active Expired - Lifetime
-
1974
- 1974-04-12 FR FR7414309A patent/FR2240484B1/fr not_active Expired
- 1974-04-19 CA CA198,075A patent/CA1009766A/en not_active Expired
- 1974-04-29 IT IT21992/74A patent/IT1010161B/it active
- 1974-05-03 GB GB1945374A patent/GB1427695A/en not_active Expired
- 1974-05-18 DE DE2424313A patent/DE2424313C2/de not_active Expired
- 1974-05-22 JP JP49056794A patent/JPS5248060B2/ja not_active Expired
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5219934A (en) * | 1975-08-04 | 1977-02-15 | Telecommunications Sa | Electromechanical band filter |
| JPS5315076A (en) * | 1976-07-28 | 1978-02-10 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam position detection method |
| JPS5319764A (en) * | 1976-08-09 | 1978-02-23 | Nippon Telegr & Teleph Corp <Ntt> | Mark detection system in electron beam exposure |
| JPS5346694B2 (US06235095-20010522-C00021.png) * | 1976-08-09 | 1978-12-15 | ||
| JPS5392670A (en) * | 1977-01-20 | 1978-08-14 | Siemens Ag | Method of positioning workpiece having mark |
| JPS5436462B2 (US06235095-20010522-C00021.png) * | 1977-01-20 | 1979-11-09 | ||
| JPS57106130A (en) * | 1980-12-24 | 1982-07-01 | Jeol Ltd | Detecting method for mark |
| JPS57122517A (en) * | 1981-01-22 | 1982-07-30 | Nippon Telegr & Teleph Corp <Ntt> | Alignment mark detector for electron beam exposure |
| JPH0328048B2 (US06235095-20010522-C00021.png) * | 1981-01-22 | 1991-04-17 | Nippon Denshin Denwa Kk | |
| JPS58122725A (ja) * | 1982-01-14 | 1983-07-21 | Nippon Telegr & Teleph Corp <Ntt> | ビ−ム形状測定装置 |
| JPH0563934B2 (US06235095-20010522-C00021.png) * | 1982-01-14 | 1993-09-13 | Nippon Telegraph & Telephone | |
| JPS6445122A (en) * | 1987-08-13 | 1989-02-17 | Jeol Ltd | Beam size measuring apparatus |
| JP2018538659A (ja) * | 2015-10-16 | 2018-12-27 | エイ・エル・ディー ヴァキューム テクノロジーズ ゲー・エム・ベー・ハーＡＬＤ Ｖａｃｕｕｍ Ｔｅｃｈｎｏｌｏｇｉｅｓ ＧｍｂＨ | 区切られた面上におけるエネルギービームの入射点の可変の位置を特定するための方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2240484B1 (US06235095-20010522-C00021.png) | 1976-06-25 |
| DE2424313A1 (de) | 1975-01-02 |
| JPS5248060B2 (US06235095-20010522-C00021.png) | 1977-12-07 |
| DE2424313C2 (de) | 1984-03-01 |
| GB1427695A (en) | 1976-03-10 |
| US3924113A (en) | 1975-12-02 |
| FR2240484A1 (US06235095-20010522-C00021.png) | 1975-03-07 |
| CA1009766A (en) | 1977-05-03 |
| IT1010161B (it) | 1977-01-10 |
