JPS5021673A - - Google Patents

Info

Publication number
JPS5021673A
JPS5021673A JP49058331A JP5833174A JPS5021673A JP S5021673 A JPS5021673 A JP S5021673A JP 49058331 A JP49058331 A JP 49058331A JP 5833174 A JP5833174 A JP 5833174A JP S5021673 A JPS5021673 A JP S5021673A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49058331A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5021673A publication Critical patent/JPS5021673A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
JP49058331A 1973-05-23 1974-05-23 Pending JPS5021673A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2326279A DE2326279A1 (de) 1973-05-23 1973-05-23 Ionenstrahlschnellschaltung zur erzielung definierter festkoerperdotierungen durch ionenimplantation

Publications (1)

Publication Number Publication Date
JPS5021673A true JPS5021673A (ja) 1975-03-07

Family

ID=5881909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49058331A Pending JPS5021673A (ja) 1973-05-23 1974-05-23

Country Status (13)

Country Link
US (1) US3970854A (ja)
JP (1) JPS5021673A (ja)
AT (1) AT353845B (ja)
BE (1) BE815436A (ja)
CA (1) CA1024865A (ja)
CH (1) CH568654A5 (ja)
DE (1) DE2326279A1 (ja)
FR (1) FR2231106B1 (ja)
GB (1) GB1458908A (ja)
IT (1) IT1012721B (ja)
LU (1) LU70135A1 (ja)
NL (1) NL7405857A (ja)
SE (1) SE393483B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5439873A (en) * 1977-09-06 1979-03-27 Nippon Denso Co Incombustible ypet flexible printed wiring board
JPS57130358A (en) * 1981-02-05 1982-08-12 Nippon Telegr & Teleph Corp <Ntt> Full automatic ion implantation device

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2412939A1 (fr) * 1977-12-23 1979-07-20 Anvar Implanteur d'ions a fort courant
HU190959B (en) * 1984-04-20 1986-12-28 Gyulai,Jozsef,Hu Method and apparatus for the irradiation of solid materials with ions
US4825080A (en) * 1986-03-25 1989-04-25 Universite De Reims Champagne-Ardenne Electrical particle gun
US4719349A (en) * 1986-05-27 1988-01-12 The United States Of America As Represented By The Department Of Health And Human Services Electrochemical sample probe for use in fast-atom bombardment mass spectrometry
EP0304525A1 (en) * 1987-08-28 1989-03-01 FISONS plc Pulsed microfocused ion beams
US5132544A (en) * 1990-08-29 1992-07-21 Nissin Electric Company Ltd. System for irradiating a surface with atomic and molecular ions using two dimensional magnetic scanning
JP3034009B2 (ja) * 1990-10-22 2000-04-17 株式会社日立製作所 イオン打込み装置
JP3123345B2 (ja) * 1994-05-31 2001-01-09 株式会社日立製作所 イオン打込み装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3117022A (en) * 1960-09-06 1964-01-07 Space Technhology Lab Inc Deposition arrangement
NL294850A (ja) * 1962-07-05
DE1498936B2 (de) * 1963-12-28 1971-01-14 Nihon Densht K K , Tokio Verfahren und Vorrichtung zur Steue rung der Expositionszeit in einem Massen spektrographen
US3476906A (en) * 1966-11-21 1969-11-04 United Aircraft Corp Resistance monitoring apparatus
US3547074A (en) * 1967-04-13 1970-12-15 Block Engineering Apparatus for forming microelements
GB1280013A (en) * 1969-09-05 1972-07-05 Atomic Energy Authority Uk Improvements in or relating to apparatus bombarding a target with ions
US3789185A (en) * 1969-12-15 1974-01-29 Ibm Electron beam deflection control apparatus
US3682729A (en) * 1969-12-30 1972-08-08 Ibm Method of changing the physical properties of a metallic film by ion beam formation and devices produced thereby
FR2076567A5 (ja) * 1970-01-20 1971-10-15 Commissariat Energie Atomique
GB1331113A (en) * 1970-11-05 1973-09-19 Secr Defence Control apparatus for an electron beam welding machine

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5439873A (en) * 1977-09-06 1979-03-27 Nippon Denso Co Incombustible ypet flexible printed wiring board
JPS5719594B2 (ja) * 1977-09-06 1982-04-23
JPS57130358A (en) * 1981-02-05 1982-08-12 Nippon Telegr & Teleph Corp <Ntt> Full automatic ion implantation device
JPH0234151B2 (ja) * 1981-02-05 1990-08-01 Nippon Telegraph & Telephone

Also Published As

Publication number Publication date
BE815436A (fr) 1974-09-16
US3970854A (en) 1976-07-20
CA1024865A (en) 1978-01-24
FR2231106A1 (ja) 1974-12-20
CH568654A5 (ja) 1975-10-31
AT353845B (de) 1979-12-10
NL7405857A (ja) 1974-11-26
SE393483B (sv) 1977-05-09
ATA363074A (de) 1979-05-15
DE2326279A1 (de) 1974-12-19
IT1012721B (it) 1977-03-10
LU70135A1 (ja) 1974-10-09
GB1458908A (en) 1976-12-15
FR2231106B1 (ja) 1978-01-27

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